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Investigation of Novel Te precursor (i-C3H7)2Te for MoTe2 Fabrication

Published online by Cambridge University Press:  30 January 2018

Y. Hibino ,
S. Ishihara ,
N. Sawamoto ,
T. Ohashi ,
K. Matsuura ,
H. Machida ,
M. Ishikawa ,
H. Sudo ,
H. Wakabayashi  and
A. Ogura
Y. Hibino*
Affiliation:
Meiji University, Kanagawa214-8571, Japan
S. Ishihara
Affiliation:
Meiji University, Kanagawa214-8571, Japan Research Fellow of the Japan Society for the Promotion of Science, Tokyo102-0083, Japan
N. Sawamoto
Affiliation:
Meiji University, Kanagawa214-8571, Japan
T. Ohashi
Affiliation:
Tokyo Institute of Technology, Kanagawa226-8502, Japan
K. Matsuura
Affiliation:
Tokyo Institute of Technology, Kanagawa226-8502, Japan
H. Machida
Affiliation:
Gas-Phase Growth Ltd., Tokyo184-0012, Japan
M. Ishikawa
Affiliation:
Gas-Phase Growth Ltd., Tokyo184-0012, Japan
H. Sudo
Affiliation:
Gas-Phase Growth Ltd., Tokyo184-0012, Japan
H. Wakabayashi
Affiliation:
Tokyo Institute of Technology, Kanagawa226-8502, Japan
A. Ogura
Affiliation:
Meiji University, Kanagawa214-8571, Japan
*
*(Email: [email protected])
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Abstract

We report the investigation on the properties of a novel Te precursor (i-C3H7)2Te and its effectiveness in fabricating MoTe2. The vapor pressure of the precursor was obtained by measuring the pressure as a function of its temperature in a sealed chamber. As a result it showed a high vapor pressure of 552.1 Pa at room temperature. The decomposition of the precursor was also investigated using DFT calculation. It was shown that the most likely reaction during the course of the decomposition of (i-C3H7)2Te is (i-C3H7)2Te → H2Te + 2 C3H7. The effectiveness of the precursor on the fabrication of MoTe2 was also investigated. Sputter-deposited MoO3 was tellurized in a quartz-tube furnace at the temperature up to 440°C. The resulting film showed that the 80% of the original MoO3 was tellurized to form MoTe2. It was also shown that further optimization of tellurization is required in order to prevent formation of metal Mo and elemental Te.

Keywords

layeredchemical vapor deposition (CVD) (deposition)sputtering
Type
Articles
Information
MRS Advances , Volume 3 , Issue 6-7: Nanomaterials , 2018 , pp. 321 - 326
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Copyright
Copyright © Materials Research Society 2018 

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References

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