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Green Lithography Using Water-Developable Sugar-Based Negative Resist Materials

Published online by Cambridge University Press:  16 May 2016

Satoshi Takei ,
Makoto Hanabata ,
Kigen Sugahara ,
Naoto Sugino ,
Takao Kameda  and
Jiro Fukushima
Satoshi Takei*
Affiliation:
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Makoto Hanabata
Affiliation:
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Kigen Sugahara
Affiliation:
Toyama Prefectural University, Imizu, Toyama 939-0398, Japan
Naoto Sugino
Affiliation:
Sanko gosei, Koreyasu Nanto, Toyama 939-1852, Japan
Takao Kameda
Affiliation:
Sanko gosei, Koreyasu Nanto, Toyama 939-1852, Japan
Jiro Fukushima
Affiliation:
Toyama Prefectural Plastic Industries Association, Toyama, Toyama 930-0866, Japan
*
*(Email: [email protected])
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Abstract

A water-developable sugar-based negative resist material was developed. This material enables the use of pure water in the development process of electron beam (EB) green lithography instead of conventionally used aqueous alkaline developers and organic solvents. The sugar-based negative resist material was developed by replacing the hydroxyl groups in alpha-linked disaccharides with EB-sensitive 2-methacryloyloxyethyl groups. The sugar-based negative resist material features highly efficient crosslinking and low film thickness shrinkage under EB irradiation. It is demonstrated to be applicable to green lithography with a 100– 500 nm line-and-space pattern and an EB exposure dose of 18 μC/cm2.

Keywords

microelectro-mechanical (MEMS)microstructurenanostructure
Type
Articles
Information
MRS Advances , Volume 1 , Issue 27: Biomaterials and Soft Materials , 2016 , pp. 1977 - 1984
Copyright
Copyright © Materials Research Society 2016 

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References

REFERENCES

Lin, Q., Steinhäusler, T., Simpson, L., Wilder, M., Medeiros, D. R., Willson, C. G., Havard, J. and Fréchet, J. M., Chemistry of materials 9 (8), 1725–1730 (1997).Google Scholar
Chae, K. H., Sun, G. J., Kang, J. K. and Kim, T. H., Journal of applied polymer science 86 (5), 1172–1180 (2002).Google Scholar
Guo, Y., Feng, F. and Miyashita, T., Bulletin of the Chemical Society of Japan 72 (10), 2149–2153 (1999).Google Scholar
Kim, J.-B., Jung, M.-H. and Chang, K.-H., European polymer journal 33 (8), 1239–1243 (1997).Google Scholar
Schenk, V., Ellmaier, L., Rossegger, E., Edler, M., Griesser, T., Weidinger, G. and Wiesbrock, F., Macromolecular rapid communications 33 (5), 396–400 (2012).Google Scholar
Liao, Y. Y. and Liu, J. H., Journal of applied polymer science 109 (6), 3849–3858 (2008).Google Scholar
Nagasaki, Y., Sato, Y., Kato, M., Aoki, H. and Tokuda, T., Journal of Photopolymer Science and Technology 12 (2), 369–372 (1999).Google Scholar
Naitoh, K., Koseki, K. i. and Yamaoka, T., Journal of applied polymer science 50 (2), 243–250 (1993).CrossRefGoogle Scholar
Murata, M., Kobayashi, E., Yumoto, Y., Miura, T. and Yamaoka, T., Journal of Photopolymer Science and Technology 4 (3), 509–516 (1991).Google Scholar
Kim, S., Marelli, B., Brenckle, M. A., Mitropoulos, A. N., Gil, E.-S., Tsioris, K., Tao, H., Kaplan, D. L. and Omenetto, F. G., Nature nanotechnology 9 (4), 306–310 (2014).Google Scholar
Takei, S., Oshima, A., Sekiguchi, A., Yanamori, N., Kashiwakura, M., Kozawa, T. and Tagawa, S., Applied Physics Express 4 (10), 106502 (2011).Google Scholar
Takei, S., Oshima, A., Wakabayashi, T., Kozawa, T. and Tagawa, S., Applied Physics Letters 101 (3), 033106 (2012).Google Scholar
Takei, S., Oshima, A., Ichikawa, T., Sekiguchi, A., Kashiwakura, M., Kozawa, T., Tagawa, S., Oyama, T. G., Ito, S. and Miyasaka, H., Microelectronic Engineering 122, 70–76 (2014).Google Scholar
Takei, S., Oshima, A., Oyama, T. G., Ito, K., Sugahara, K., Kashiwakura, M., Kozawa, T., Tagawa, S. and Hanabata, M., Japanese Journal of Applied Physics 53 (11), 116505 (2014).Google Scholar
Takei, S., Maki, H., Sugahara, K., Ito, K., and Hanabata, M., AIP adv. 5, 077141 (2015).Google Scholar
Takei, S., and Hanabata, M., Appl. Phys. Lett. 107, 141904 (2015).Google Scholar
Takei, S., Ogawa, T., Deschner, R., Jen, K., Nihira, T., Hanabata, M. and Willson, C. G., Japanese Journal of Applied Physics 49 (7), 075201 (2010).Google Scholar
Takei, S., Ogawa, T., Deschner, R. and Willson, C. G., Microelectronic Engineering 116, 44–50 (2014).Google Scholar
Takei, S. and Hanabata, M., Materials Letters 143, 197–200 (2015).Google Scholar
Takei, S., Micro & Nano Letters 7 (8), 822 (2012).Google Scholar