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Aqueous Degradation of Polyamide Membrane Materials in Halogenated Environments

Published online by Cambridge University Press:  20 June 2016

Logan T. Kearney  and
John A. Howarter
Logan T. Kearney
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, United States
John A. Howarter*
Affiliation:
Division of Environmental and Ecological Engineering, Purdue University, West Lafayette, Indiana 47907, United States
*
*(Email: [email protected])
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Abstract

Model polyamide thin films were prepared through a controlled interfacial polymerization route known as molecular layer by layer (mLbL). Films were synthesized directly onto quartz crystals and subjected to halogenated aqueous environments that are known to cause degradation of the amide network. A quartz crystal microbalance (QCM) was used as the detection platform to ascertain mass loss due to degradation in real time. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) measurements were also performed at various stages of the degradation sequence to elucidate the chemical and morphological changes at the surfaces respectively. Appropriate strategies for accurately comparing material degradation resistance are proposed along with modifications to the crosslinked polyamide chemistry to produce more halogen tolerant polymeric surfaces.

Keywords

thin filmpolymerx-ray photoelectron spectroscopy (XPS)
Type
Articles
Information
MRS Advances , Volume 1 , Issue 35: Materials Design , 2016 , pp. 2421 - 2426
Copyright
Copyright © Materials Research Society 2016 

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References

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