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Time-resolved measurements of extreme ultraviolet (EUV) emission, from EUV-induced He, Ne, and Ar plasmas

Published online by Cambridge University Press:  19 March 2019

A. Bartnik Open the ORCID record for A. Bartnik [Opens in a new window] ,
H. Fiedorowicz ,
P. Wachulak  and
T. Fok
A. Bartnik*
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
H. Fiedorowicz
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
P. Wachulak
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
T. Fok
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland
*
Author for correspondence: A. Bartnik, Institute of Optoelectronics, Military University of Technology, Warsaw, Poland. E-mail: [email protected]
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Abstract

Irradiation of gases with intense pulses of extreme ultraviolet (EUV) can result in the formation of low-temperature plasmas. During the time of irradiation, various non-thermal processes driven by the EUV photons and photoelectrons take place, leading to the creation of excited states of atoms and ions. Fast relaxation of these states should result in EUV emission within a time comparable to the driving EUV pulse. On the other hand, from our earlier works, a time duration of the emission in an optical range is over an order of magnitude longer. It can be thus expected that the time of EUV emission can be also relatively long. In this work, time-resolved measurements of the EUV emission from low-temperature plasmas induced in He, Ne, and Ar gases were performed. Due to a low intensity of the emitted radiation, a specially prepared detection system, based on an EUV collector and an EUV sensitive photodiode, was employed. In all cases, a time duration of the EUV emission was much longer compared with the driving EUV pulse. Time profiles of the corresponding signals were specific for particular gases. In case of He and Ne plasmas, these time profiles varied with initial densities of gases to be ionized. The corresponding dependence was especially visible in case of plasmas induced in helium. In case of Ar plasmas, such dependence was not revealed.

Keywords

EUV opticsEUV sourcelaser-produced plasmaphotoionization
Type
Research Article
Information
Laser and Particle Beams , Volume 37 , Issue 1 , March 2019 , pp. 49 - 54
Copyright
Copyright © Cambridge University Press 2019 

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References

Bailey, JE, Cohen, D, Chandler, G, Cuneo, M, Foord, M, Heeter, R, Jobe, D, Lake, P, Liedahl, D, MacFarlane, J, Nash, T, Nielson, D, Smelser, R and Stygar, W (2001) Neon photoionization experiments driven by Z-pinch radiation. Journal of Quantitative Spectroscopy and Radiative Transfer 71, 157.Google Scholar
Bartnik, A, Wachulak, P, Fiedorowicz, H, Fok, T, Jarocki, R and Szczurek, M (2014) Extreme ultraviolet-induced photoionized plasmas. Physica Scripta T161, 014061.Google Scholar
Bartnik, A (2015 a) Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: Interaction of the radiation pulses with matter (Review). Optoelectronics Review 23, 172–186.Google Scholar
Bartnik, A, Wachulak, P, Fok, T, Węgrzynski, L, Fiedorowicz, H, Skrzeczanowski, W, Pisarczyk, T, Chodukowski, T, Kalinowska, Z, Dudzak, R, Dostal, J, Krousky, E, Skala, J, Ullschmied, J, Hrebicek, J and Medrik, T (2015 b) Photoionized argon plasmas induced with intense soft x-ray and extreme ultraviolet pulses. Plasma Physics and Controlled Fusion 58, 014009.10.1088/0741-3335/58/1/014009Google Scholar
Bartnik, A, Fiedorowicz, H, Wachulak, P and Fok, T (2018) Temporal measurements of extreme ultraviolet (EUV) emission from low temperature, EUV-induced plasmas. Laser and Particle Beams 36, 286–292.Google Scholar
Cohen, DH, MacFarlane, JJ, Bailey, JE and Liedahl, DA (2003) X-ray spectral diagnostics of neon photoionization experiments on the Z-machine. Review of Scientific Instruments 74, 1962.Google Scholar
Fahy, K, Dunne, P, McKinney, L, O'Sullivan, G, Sokell, E, White, J, Aguilar, A, Pomeroy, JM, Tan, JN, Blagojevic, B, LeBigot, E-O and Gillaspy, JD (2004) UTA versus line emission for EUVL: studies on xenon emission at the NIST EBIT. Journal of Physics D: Applied Physics 37, 3225–3232.Google Scholar
Falcon, RE, Rochau, GA, Bailey, JE, Ellis, JL, Carlson, AL, Gomez, TA, Montgomery, MH, Winget, DE, Chen, EY, Gomez, MR and Nash, TJ (2013) An experimental platform for creating white dwarf photospheres in the laboratory. High Energy Density Physics 9, 82–90.10.1016/j.hedp.2012.10.005Google Scholar
Fujioka, S, Takabe, H, Yamamoto, N, Salzmann, D, Wang, F, Nishimura, H, Li, Y, Dong, Q, Wang, S, Zhang, Y, Rhee, Y, Lee, Y, Han, J, Tanabe, M, Fujiwara, T, Nakabayashi, Y, Zhao, G, Zhang, J and Mima, K (2009) X-ray astronomy in the laboratory with a miniature compact object produced by laser-driven implosion. Nature Physics 5, 821–825.Google Scholar
Kapteyn, HC and Falcone, RW (1988) Auger-pumped short-wavelength lasers in xenon and krypton. Physical Review A 37, 2033–2038.Google Scholar
Kapteyn, HC, Lee, RW and Falcone, RW (1986) Observation of a short-wavelength laser pumped by Auger decay. Physical Review Letters 57, 2939–2942.Google Scholar
Kelly, RL (1987) Atomic and ionic spectrum lines below 2000 angstroms: hydrogen through krypton part I (H-Cr). Journal of Physical and Chemical Reference, 16 (Supp. 1), 1–649.Google Scholar
Könneckea, R, Follath, R, Pontius, N, Schlappa, J, Eggenstein, F, Zeschke, T, Bischoff, P, Schmidt, J-S, Nolla, T, Trabanta, C, Schreck, S, Wernet, PH, Eisebitt, S, Senf, F, Schüßler-Langeheine, C, Erko, A and Föhlisch, A (2013) The confocal plane grating spectrometer at BESSY II. Journal of Electron Spectroscopy and Related Phenomena 188, 133–139.Google Scholar
Pequignot, D, Petitjean, P and Boisson, C (1991) Total and effective recombination coefficiets, Astron. Astrophysical 251, 680–688.Google Scholar
Ralchenko, YU, Janev, RK, Kato, T, Fursa, DV, Bray, I and de Heer, FJ (2008) Electron-impact excitation and ionization cross sections for ground state and excited helium atoms. Atomic Data and Nuclear Data Tables 94, 603–622.Google Scholar
Rohringer, N, Ryan, D, London, RA, Purvis, M, Albert, F, Dunn, J, Bozek, JD, Bostedt, C, Graf, A, Hill, R, Hau-Riege, SP and Rocca, JJ (2012) Atomic inner-shell X-ray laser at 1.46 nanometres pumped by an X-ray free-electron laser. Nature 481, 488–491.Google Scholar
Sher, MH, Macklin, JJ, Young, JF and Harris, SE (1987) Saturation of the Xe III 109-nm laser using traveling-wave laser-produced-plasma excitation. Optics Letters 12, 891–893.Google Scholar
van de Ven, THM, Reefman, P, de Meijere, CA, van der Horst, RM, van Kampen, M, Banine, VY and Beckers, J (2018) Ion energy distributions in highly transient EUV induced plasma in hydrogen. Journal of Applied Physics 123, 063301.10.1063/1.5017303Google Scholar
van der Horst, RM, Beckers, J, Nijdam, S and Kroesen, GMW (2014) Exploring the temporally resolved electron density evolution in extreme ultra-violet induced plasmas. Journal of Physics D: Applied Physics 47, 302001.Google Scholar
van der Horst, RM, Beckers, J, Osorio, EA and Banine, VY (2015 a) Dynamics of the spatial electron density distribution of EUV-induced plasmas. Journal of Physics D: Applied Physics 48, 432001.Google Scholar
van der Horst, RM, Beckers, J, Osorio, EA, van de Ven, THM and Banine, VY (2015 b) Radiating plasma species density distribution in EUV-induced plasma in argon: a spatiotemporal experimental study. Plasma Sources Science and Technology 24, 065016.Google Scholar
van der Horst, RM, Beckers, J, Osorio, EA, Astakhov, DI, Goedheer, WJ, Lee, CJ, Ivanov, VV, Krivtsum, VM, Koshelev, KN, Lopaev, DV, Bijkerk, F and Banine, VY (2016 a) Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen. Journal of Physics D: Applied Physics 49, 145203.Google Scholar
van der Horst, RM, Osorio, EA, Banine, VY and Beckers, J (2016 b) The influence of the EUV spectrum on plasma induced by EUV radiation in argon and hydrogen gas. Plasma Sources Science and Technology 25, 015012.10.1088/0963-0252/25/1/015012Google Scholar
Verner, DA, Verner, EM and Ferland, GJ (1996) Atomic data for permitted resonance lines of atoms and ions from H to Si, and S, Ar, Ca, and Fe. Atomic Data and Nuclear Data Tables 64, 1–180.Google Scholar
Wei, HG, Shi, JR, Zhao, G, Zhang, Y, Dong, QL, Li, YT, Wang, SJ, Zhang, J, Liang, ZT, Zhang, JY, Wen, TS, Zhang, WH, Hu, X, Liu, SY, Ding, YK, Zhang, L, Tang, YJ, Zhang, BH, Zheng, ZJ, Nishimura, H, Fujioka, S, Wang, FL and Takabe, H (2008) Opacity studies of silicon in radiatively heated plasmas. Astrophysical Journal 683, 577–583.Google Scholar