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Study of XUV beam splitter flatness for use on a Michelson interferometer

Published online by Cambridge University Press:  01 July 2004

ANNE-SOPHIE MORLENS
Affiliation:
Laboratoire d'Interaction des Rayonnements X avec la Matière (LIXAM), LOA-ENSTA, chemin de la Hunière Palaiseau cedex, France
PHILIPPE ZEITOUN
Affiliation:
Laboratoire d'Interaction des Rayonnements X avec la Matière (LIXAM), LOA-ENSTA, chemin de la Hunière Palaiseau cedex, France
LAURENT VANBOSTAL
Affiliation:
Laboratoire d'Interaction des Rayonnements X avec la Matière (LIXAM), LOA-ENSTA, chemin de la Hunière Palaiseau cedex, France
PASCAL MERCERE
Affiliation:
Laboratoire d'Interaction des Rayonnements X avec la Matière (LIXAM), LOA-ENSTA, chemin de la Hunière Palaiseau cedex, France
GRÉGORY FAIVRE
Affiliation:
Laboratoire d'Interaction des Rayonnements X avec la Matière (LIXAM), LOA-ENSTA, chemin de la Hunière Palaiseau cedex, France
SÉBASTIEN HUBERT
Affiliation:
Laboratoire d'Interaction des Rayonnements X avec la Matière (LIXAM), LOA-ENSTA, chemin de la Hunière Palaiseau cedex, France
PHILIPPE TROUSSEL
Affiliation:
CEA-DAM/ DRIF/ DCRE/SDE, Bruyères-le-Châtel, France
CHRISTIAN REMOND
Affiliation:
CEA-DAM/ DRIF/ DCRE/SDE, Bruyères-le-Châtel, France
RÉMY MARMORET
Affiliation:
CEA-DAM/ DRIF/ DCRE/SDE, Bruyères-le-Châtel, France
FRANCK DELMOTTE
Affiliation:
Laboratoire Charles Fabry de l'Institut d'Optique–CNRS UMR, Centre Scientifique, Orsay, France
MARIE-FRANÇOISE RAVET
Affiliation:
Laboratoire Charles Fabry de l'Institut d'Optique–CNRS UMR, Centre Scientifique, Orsay, France
MARC ROUILLAY
Affiliation:
Laboratoire Charles Fabry de l'Institut d'Optique–CNRS UMR, Centre Scientifique, Orsay, France

Abstract

A XUV Michelson interferometer has been developed by LIXAM/CEA/LCFIO and has been tested as a Fourier-transform spectrometer for measurement of X-ray laser line shape. The observed strong deformation of the interference fringes limited the interest of such an interferometer for plasma probing. Because the fringe deformation was coming from a distortion of the beam splitter (5 × 5 mm2 open aperture, about 150 nm thick), several parameters of the multilayer deposition used for the beam splitter fabrication have been recently optimized. The flatness has been improved from 80 nm rms obtained by using the ion beam sputtering technique, to 20 nm rms by using the magnetron sputtering technique. Over 3 × 3 mm2, the beam splitter has a flatness better than 4 nm rms.

Type
Research Article
Copyright
© 2004 Cambridge University Press

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