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The development of a joule level of XeF(C-A) laser by optical pumping

Published online by Cambridge University Press:  05 December 2005

LI YU
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China
JING-RU LIU
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China
LIAN-YING MA
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China
AI-PING YI
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China
CHAO HUANG
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China
XIAO-XIA AN
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China
YONG-SHENG ZHANG
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China
JIAN-CANG SU
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China
ZHENG-ZHONG ZENG
Affiliation:
Northwest Institute of Nuclear Technology, Xi'an, China

Abstract

A joule level of XeF(C-A) laser optically pumped by a sectioned surface discharge was developed. The irradiative intensity of pumping source was diagnosed by calculating XeF2 photo-dissociation wave evolvement which was photographed by a framing camera. The photon flux in the wavelength region of 140 to 170nm is about 5 × 1023 photon s−1cm−2, that corresponds to the irradiative brightness temperature of more than 25000 K. The laser experiments were carried out in different conditions. The maximum laser output energy of 2.5 J was obtained with the total conversion efficiency of 0.1%.

Type
Research Article
Copyright
© 2005 Cambridge University Press

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