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Picosecond high power KrF laser system for X-ray laser research

Published online by Cambridge University Press:  09 March 2009

T. Tomie
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
I. Okuda
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
Y. Owadano
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
M. Tanimoto
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
Y. Matsumoto
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
S. Komeiji
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
K. Koyama
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
I. Matsushima
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
A. Yaoita
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305
M. Yano
Affiliation:
Electrotechnical Laboratory, 1-1-4, Umezono, Tsukuba, Ibaraki, Japan 305

Abstract

Fundamental parameters are studied for the detailed design of a picosecond high power KrF laser system. The saturation energy density of 2.3 mJ/cm2 and gain recovery time of 1.9 ns in an e-beam pumped KrF laser are observed. A 6 ps pulse is amplified to 1.9 J. The system at the Electrotechnical Laboratory is expected to deliver 10 ps pulses with total energy of several tens of joules in several beams.

Type
Research Article
Copyright
Copyright © Cambridge University Press 1990

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References

Barr, J. R. M. et al. 1988 Opt. Comm. 66, 127.CrossRefGoogle Scholar
Bucksbaum, P. H. et al. 1987 Opt. Lett. 7, 399.CrossRefGoogle Scholar
Dove, A. K. & Pert, G. J. 1984 J. Phys. B17, 4953.Google Scholar
Endoh, A., Watanabe, M. & Watanabe, S. 1987 Opt. Lett. 12, 906.CrossRefGoogle Scholar
Key, M. H. et al. 1988 Proc. 19th ECLIM(Madrid) OR1–13.Google Scholar
Owadano, Y. et al. 1987 Fusion Technology 11, 486.Google Scholar
Shaw, M. J. et al. 1988 Proc. 19th ECLIM(Madrid) OR11-C1.CrossRefGoogle Scholar
Szatmari, S. & Schafer, F. P. 1987 J. Opt. Soc. Am. B4, 1943.Google Scholar
Taylor, A. J., Roberts, J. P. & Gibson, R. B. 1988 Appl. Phys. Lett. 52, 773.Google Scholar
Tomie, T. 1988 Electrotechnical Laboratory, Technical Report, TR-88–38.Google Scholar
Tomie, T., Okuda, I. & Yano, M. 1988 (to be published).Google Scholar