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Surface Morphology Anisotropy and Stress Distribution Uniformity in Annealed Cu–W Films

Published online by Cambridge University Press:  03 March 2011

Y. Wang ,
X.-H Li ,
Y.-H Chen ,
K.-W Xu  and
D.W. Fan
Y. Wang*
Affiliation:
State-Key Laboratory for Mechanical Behavior of Materials, Xian Jiaotong University,Xian 710049, People’s Republic of China; and Department of Mechanical Engineering,Lanzhou Railway Institute, Lanzhou 730070, People’s Republic of China
X.-H Li
Affiliation:
Signal & Information Processing Lab., Beijing University of Technology,Beijing 100022, People’s Republic of China
Y.-H Chen
Affiliation:
State-Key Laboratory for Mechanical Behavior of Materials, Xian Jiaotong University,Xian 710049, People’s Republic of China
K.-W Xu
Affiliation:
State-Key Laboratory for Mechanical Behavior of Materials, Xian Jiaotong University,Xian 710049, People’s Republic of China
D.W. Fan
Affiliation:
Key Lab. of Opto-Electronic Technology & Intelligent Control, Lanzhou Railway Institute,Lanzhou 730070, People’s Republic of China
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Copper-tungsten films were deposited on Si and Al2O3 substrates by magnetron sputtering and then in situ annealed in vacuum chamber at different temperatures. X-ray diffraction (XRD), scanning electron microscopy (SEM), and the polarization phase shift technique were used to characterize the microstructure, surface morphology, and residual stress of Cu–W films. The results indicated that there are two successive but distinctive stages of phase transition with the change of annealing temperatures. The evolution of surface morphology of Cu–W thin films shows a significant effect on the distribution of in-plane stresses. A strategy of integrating discrete wavelet transform and fractal geometry concepts was developed to analyze the anisotropy of surface structure of Cu–W thin films. The correlation between the anisotropy of surface morphology and the stress distribution of thin films was constructed. It is found that the stress distribution of the thin films is sensitive to the variations of the anisotropy of the surface structure with annealing temperature. The variation in the uniformity of in-plane stress distribution with the evolution of surface structure of thin films is independent of the choice of substrate materials.

Keywords

MorphologyPhase transformationThin film
Type
Articles
Information
Journal of Materials Research , Volume 20 , Issue 1 , January 2005 , pp. 151 - 160
Copyright
Copyright © Materials Research Society 2004

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