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The study on charge-density distribution in TiAl by quantitative electron crystallography method

Published online by Cambridge University Press:  03 March 2011

Yu Miao ,
Jing Zhu ,
X.W. Lin  and
W.J. Jiang
Yu Miao
Affiliation:
Department of Physics, Central Iron and Steel Research Institute, Beijing 100081, People's Republic of China
Jing Zhu
Affiliation:
Department of Physics, Central Iron and Steel Research Institute, Beijing 100081, People's Republic of China
X.W. Lin
Affiliation:
Department of Physics, Central Iron and Steel Research Institute, Beijing 100081, People's Republic of China
W.J. Jiang
Affiliation:
National Laboratory of Metal Matrix Composite Materials, Shanghai Jiao Tong University, Shanghai 200030, People's Republic of China
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Abstract

Structure factors of μ-TiAl equiaxed grain in TiAl duplex intermetallic compound before and after V-alloying were measured by the quantitative electron crystallography method. Then the structure factors were transferred into charge-density distributions of real space. Comparing the charge-density distributions in γ-TiAl with those in V-alloyed γ-TiAl, it was found that V-alloying with the optimum amount decreases the electronic charge density in the Ti-Ti interatomic bond, and increases the electronic charge density in the Al-Al interatomic bond and Ti-Al interatomic bond. Thus, the anisotropy of charge-density distribution in γ-TiAl equiaxed grain is reduced.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 8 , August 1995 , pp. 1913 - 1916
Copyright
Copyright © Materials Research Society 1995

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References

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