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A Study of Nanostructures of Thin Films in B–C–N System Produced by Pulsed Laser Deposition and Nitrogen Ion-Beam-Assisted Pulsed Laser Deposition

Published online by Cambridge University Press:  03 March 2011

S. Bysakh ,
K. Chattopadhyay ,
H. Ling ,
J.D. Wu ,
C. Dong ,
Y.Q. Wang ,
X.F. Duan  and
K.H. Kuo
S. Bysakh
Affiliation:
Department of Metallurgy, Indian Institute of Science, Bangalore, India
K. Chattopadhyay
Affiliation:
Department of Metallurgy, Indian Institute of Science, Bangalore, India
H. Ling
Affiliation:
Joint State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, Fudan University, Shanghai, People’s Republic of China
J.D. Wu
Affiliation:
Joint State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, Fudan University, Shanghai, People’s Republic of China
C. Dong
Affiliation:
Joint State Key Laboratory for Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian, People’s Republic of China
Y.Q. Wang
Affiliation:
Beijing Laboratory of Electron Microscopy, Chinese Academy of Sciences, Beijing, People’s Republic of China
X.F. Duan
Affiliation:
Beijing Laboratory of Electron Microscopy, Chinese Academy of Sciences, Beijing, People’s Republic of China
K.H. Kuo
Affiliation:
Beijing Laboratory of Electron Microscopy, Chinese Academy of Sciences, Beijing, People’s Republic of China
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Abstract

We report the synthesis of thin films of B–C–N and C–N deposited by N+ ion-beam-assisted pulsed laser deposition (IBPLD) technique on glass substrates at different temperatures. We compare these films with the thin films of boron carbide synthesized by pulsed laser deposition without the assistance of ion-beam. Electron diffraction experiments in the transmission electron microscope shows that the vapor quenched regions of all films deposited at room temperature are amorphous. In addition, shown for the first time is the evidence of laser melting and subsequent rapid solidification of B4C melt in the form of micrometer- and submicrometer-size round particulates on the respective films. It is possible to amorphize B4C melt droplets of submicrometer sizes. Solidification morphologies of micrometer-size droplets show dispersion of nanocrystallites of B4C in amorphous matrix within the droplets. We were unable to synthesize cubic carbon nitride using the current technique. However, the formation of nanocrystalline turbostratic carbo- and boron carbo-nitrides were possible by IBPLD on substrate at elevated temperature and not at room temperature. Turbostraticity relaxes the lattice spacings locally in the nanometric hexagonal graphite in C–N film deposited at 600 °C leading to large broadening of diffraction rings.

Keywords

AmorphousElectron energy loss spectroscopy (EELS)Ablation
Type
Articles
Information
Journal of Materials Research , Volume 19 , Issue 3 , March 2004 , pp. 759 - 767
Copyright
Copyright © Materials Research Society 2004

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References

REFERENCES

1Liu, A.Y. and Cohen, M.L., Science 245, 841 (1989).Google Scholar
2Ehrhardt, H., Surf. Coat. Technol. 74/75, 29 (1995).Google Scholar
3Muhl, S. and Mendez, J.M., Diam. Relat. Mater. 8, 1809 (1999).CrossRefGoogle Scholar
4Ronning, C., Feldermann, R., Merk, R., Hofsass, H., Reinke, P. and Thiele, J.U., Phys. Rev. B 58, 2207 (1998).CrossRefGoogle Scholar
5Sugino, T. and Hieda, H., Diam. Relat. Mater. 9, 1233 (2000).CrossRefGoogle Scholar
6Whole, J., Ahn, H. and Rie, K.T., Surf. Coat. Technol. 116–119, 1166 (1999).Google Scholar
7Kalss, W., Haubner, R. and Lux, B., Int. J. Refractory Metals & Hard Mater. 16, 233 (1998).CrossRefGoogle Scholar
8Gago, R., Jimenez, I. and Albella, J.M., Thin Solid Films 373, 277 (2000).CrossRefGoogle Scholar
9Laidani, N., Anderle, M., Canteri, R., Elia, L., Luches, A., Martino, M., Micheli, V. and Speranza, G., Appl. Surf. Sci. 157, 135 (2000).Google Scholar
10Saenger, K.L., Process. Adv. Mater. 2, 1 (1993).Google Scholar
11Chrisey, D.B. and Hubler, G.K.: Pulsed Laser Deposition of Thin Films (John Wiley & Sons, New York, 1994).Google Scholar
12Jackson, T.J. and Palmer, S.B., J. Phys. D: Appl. Phys. 27, 1581 (1994).CrossRefGoogle Scholar
13Duwez, P., Willens, R.H. and Klement, W., J. Appl. Phys. 31, 1136 (1960).CrossRefGoogle Scholar