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Sputtering synthesis and properties of molybdenum nanocrystals and Al/Mo layered nanocomposites

Published online by Cambridge University Press:  31 January 2011

G.M. Chow ,
A. Pattnaik ,
T.E. Schlesinger ,
R.C. Cammarata ,
M.E. Twigg  and
A.S. Edelstein
G.M. Chow
Affiliation:
Naval Research Laboratory, Washington, DC 20375
A. Pattnaik
Affiliation:
Naval Research Laboratory, Washington, DC 20375
T.E. Schlesinger
Affiliation:
Department of Materials Science and Engineering, The Johns Hopkins University, Baltimore, Maryland 21218
R.C. Cammarata
Affiliation:
Department of Materials Science and Engineering, The Johns Hopkins University, Baltimore, Maryland 21218
M.E. Twigg
Affiliation:
Naval Research Laboratory, Washington, DC 20375
A.S. Edelstein
Affiliation:
Naval Research Laboratory, Washington, DC 20375
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Abstract

Molybdenum nanocrystals (4 nm < particle size < 12 nm) were synthesized in the vapor by sputtering in a thermal gradient at argon pressures between 0.2 and 0.6 Torr. The gradient was achieved by cooling the substrate table with liquid nitrogen in order to enhance the deposition rate of the nanocrystals. The size of these nanocrystals depended on the sputtering argon gas pressure. Using appropriate deposition parameters, these nanocrystals were incorporated, either as a dispersed phase in a major phase produced by normal sputtering or as a layer in a layered structure to produce nanocomposite films. Results of Auger electron spectroscopy (AES) study of the Al/Mo layered nanocomposite films are presented. The Knoop microhardness of these films was increased by as much as a factor of four compared with the hardness of homogeneous Al films. A correlation of the microhardness to the microstructures as revealed by transmission electron microscopy (TEM) is discussed.

Type
Articles
Information
Journal of Materials Research , Volume 6 , Issue 4 , April 1991 , pp. 737 - 743
Copyright
Copyright © Materials Research Society 1991

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References

1Liou, S. H., Chen, C. H., Chen, H. S., Kortan, A. R., and Chien, C. L., in Multicomponent Ultrafine Microstructures, edited by McCandish, L. E., Kear, B. H., Polk, D. E., and Siegel, R. W. (Mater. Res. Soc. Symp. Proc. 132, Pittsburgh, PA, 1989), p. 191.Google Scholar
2Edelstein, A. S., Das, B. N., Holtz, R. L., Koon, N. C., Rubinstein, M., Wolf, S. A., and Kihlstrom, K. E., J. Appl. Phys. 61, 3320 (1987).CrossRefGoogle Scholar
3Chow, G. M., Holtz, R. L., Pattnaik, A., Edelstein, A. S., Schlesinger, T. E., and Cammarata, R. C., Appl. Phys. Lett. 56, 1853 (1990).CrossRefGoogle Scholar
4 John Thornton, A. and Hoffman, D. W., Thin Solid Films 171, 5 (1989).CrossRefGoogle Scholar
5Granqvist, C. G. and Buhrman, R. A., J. Appl. Phys. 47, 2200 (1976).CrossRefGoogle Scholar
6Siegel, R. W., Ramasamy, S., Hahn, H., Zongquan, Li, and Ting, Lu, J. Mater. Res. 3, 1367 (1988).CrossRefGoogle Scholar
7Chow, G. M., Klemens, P. G., and Strutt, P. R., J. Appl. Phys. 66, 3304 (1989).CrossRefGoogle Scholar
8Tholen, A. R., Acta Metall. 27, 1765 (1979).CrossRefGoogle Scholar
9Davies, J. T. and Rideal, E. K., Interfacial Phenomena (Academic Press, New York and London, 1963).Google Scholar
10Madden, H. H., J. Vac. Sci. Technol. 18, 677 (1981).CrossRefGoogle Scholar
11Wagner, C.D. and Taylor, J. A., J. Electron Spectrosc. 20, 83 (1980).CrossRefGoogle Scholar
12Kitada, Masahiro and Shimizu, Noboru, J. Mater. Sci. 19, 1339 (1984).CrossRefGoogle Scholar
13Chow, G. M., Chien, C. L., and Edelstein, A. S., J. Mater. Res. 6, 8 (1991).CrossRefGoogle Scholar
14Hardness Testing, edited by Boyer, H. E. (ASM INTERNATIONAL, Metals Park, OH, 1987).Google Scholar