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A new method for fabricating high performance polymeric thin films by chemical vapor polymerization

Published online by Cambridge University Press:  31 January 2011

Justin F. Gaynor ,
J. Jay Senkevich  and
Seshu B. Desu
Justin F. Gaynor*
Affiliation:
Texas Instruments Semiconductor Process / Device Center, 13536 N. Central Expressway, 75243 P.O. Box 655012, MS 944, Dallas, Texas 75265
J. Jay Senkevich
Affiliation:
Department of Materials Science and Engineering, Virginia Polytechnic Institute and State University, 213 Holden Hall, Blacksburg, Virginia 24601–0237
Seshu B. Desu
Affiliation:
Department of Materials Science and Engineering, Virginia Polytechnic Institute and State University, 213 Holden Hall, Blacksburg, Virginia 24601–0237
*
a) Author to whom correspondence should be addressed.
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Abstract

A vacuum deposition method is presented in which copolymer films are grown from a vinylic monomer chosen for desirable properties and paraxylylene. The concentration of paraxylylene in the final copolymer can be negligibly small if proper deposition conditions, presented here for the first time, are employed. Films of paraxylylene with N-phenyl maleimide deposited at 40 °C, for example, showed thermal stability and FTIR spectra nearly identical with homopolymers of poly(N-phenyl maleimide). Different rate-limiting steps are proposed to explain film composition; paraxylylene is under surface reaction control, while the comonomer obeys mass flow control. This results in a deposition environment extremely rich in comonomer. Growth rates and compositions were consistent with predictions. The initiation reaction did not appear different from homopolymerization of paraxylylene. The general method presented here allows fabrication of vapor-deposited thin films with properties limited primarily by the comonomer employed.

Type
Articles
Information
Journal of Materials Research , Volume 11 , Issue 7 , July 1996 , pp. 1842 - 1850
Copyright
Copyright © Materials Research Society 1996

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