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Ion beam mixing, diffusion, and phase stability in Cu/Al2O3 interfaces

Published online by Cambridge University Press:  31 January 2011

K. Neubeck ,
H. Hahn ,
A. G. Balogh ,
H. Baumann ,
K. Bethge ,
D. M. Rück  and
N. Angert
K. Neubeck
Affiliation:
Department of Materials Science, Technical University, Darmstadt, Germany
H. Hahn
Affiliation:
Department of Materials Science, Technical University, Darmstadt, Germany
A. G. Balogh
Affiliation:
Department of Materials Science, Technical University, Darmstadt, Germany
H. Baumann
Affiliation:
Institut für Kernphysik, J. W. Goethe Universität, Frankfurt am Main, Germany
K. Bethge
Affiliation:
Institut für Kernphysik, J. W. Goethe Universität, Frankfurt am Main, Germany
D. M. Rück
Affiliation:
Institute for Heavy Ion Research (GSI), Darmstadt, Germany
N. Angert
Affiliation:
Institute for Heavy Ion Research (GSI), Darmstadt, Germany
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Abstract

Ion beam mixing, diffusion properties, and phase stability have been investigated in Cu/Al2O3 bilayer samples. Specimens were prepared by vapor deposition and irradiated with 150 keV Ar+ ions up to a fluence of 1.5 · 1017 Ar+/cm2. Sample temperature under irradiation was varied between 77 K and 673 K. The mixing behavior was studied by analyzing the concentration depth profiles, determined by Rutherford Backscattering Spectroscopy. It was found that mixing efficiencies of Cu, Al, and O scale with Ar+ fluence. Radiation enhanced diffusion (RED), observed above room temperature, is separated from ballistic mixing and high temperature diffusion. The migration enthalpy for interdiffusion in the RED region (between RT and 300 °C) was estimated to be approximately 0.3 eV. Sputtering yields depending on temperature gradient near to sample and phase stability versus ion dose and temperature are also discussed.

Type
Articles
Information
Journal of Materials Research , Volume 11 , Issue 5 , May 1996 , pp. 1277 - 1283
Copyright
Copyright © Materials Research Society 1996

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References

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