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Influence of nitrogen implantation on the properties of Ti and substoichiometric TiNx films deposited on high speed steel

Published online by Cambridge University Press:  31 January 2011

M. T. Rodrigo ,
C. Jiménez ,
L. Váquez ,
F. Alonso ,
M. Fernández  and
J. M. Martínez-Duart
M. T. Rodrigo
Affiliation:
Universidad Autónoma de Madrid, 28049 Madrid, Spain
C. Jiménez
Affiliation:
Universidad Autónoma de Madrid, 28049 Madrid, Spain
L. Váquez
Affiliation:
Instituto Ciencia de Materiales, C.S.I.C., 28049 Madrid, Spain
F. Alonso
Affiliation:
INASMET-Camino de Portuetxe, 12-20009 San Sebastián, Spain
M. Fernández
Affiliation:
Instituto Ciencia de Materiales, C.S.I.C., 28049 Madrid, Spain
J. M. Martínez-Duart
Affiliation:
Universidad Autónoma de Madrid, 28049 Madrid, Spain
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Abstract

Ti and TiNx (x < 1) thin films have been deposited on high speed steel (HSS) substrates by reactive sputtering and then N+ implanted. The increase of the N/Ti ratio of the films during deposition is related to a decrease in their roughness, and N+ implantation produces another additional slight decrease of the roughness. The hardness of samples increases with the nitrogen content in the as-deposited samples; nevertheless, N+-implanted Ti coatings show lower values of hardness than reactive sputtered TiNx films. α–Ti, ε–Ti2N, and δ–TiN phases were identified by grazing x-ray diffraction.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 8 , August 1998 , pp. 2117 - 2122
Copyright
Copyright © Materials Research Society 1998

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