Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-12-01T00:05:44.288Z Has data issue: false hasContentIssue false
  • English
  • Français

Indium oxide/indium iron oxide thin films for photoelectrochemical hydrogen production with a-silicon solar cells

Published online by Cambridge University Press:  31 January 2011

William B. Ingler Jr.  and
Abbasali Naseem
Abbasali Naseem
Affiliation:
University of Toledo, Department of Physics and Astronomy, MS 111, McMaster Hall, Toledo, Ohio 43606
Get access

Abstract

In this paper we focus on indium oxide and indium iron oxide as an alloy to fabricate a protective thin film (transparent, conductive, and corrosion resistant; TCCR) for amorphous silicon-based solar cells, which can be used in immersion-type photoelectrochemical cells for hydrogen production. From the work completed, the results indicate that samples made at 250 °C with indium and indium iron oxide targets powered at 30 and 100 W, respectively, and a sputter deposition time of 90 min produced optimal results when deposited directly on single-junction amorphous silicon solar cells. At 0.65 V (versus SCE), the best sample conditions display a maximum current density of 21.4 μA/cm2.

Keywords

energy storageoxidesputtering
Type
Articles
Information
Journal of Materials Research , Volume 25 , Issue 1: Photocatalysis for Energy and Environmental Sustainability , January 2010 , pp. 25 - 31
Copyright
Copyright © Materials Research Society 2010

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Miller, E.L., Rocheleau, R.E., Deng, X.Design considerations for a hybrid amorphous silicon/photoelectrochemical multijunction cell for hydrogen production. Int. J. Hydrogen Energy 28, 615 (2003)CrossRefGoogle Scholar
2.Miller, E.L., Rocheleau, R.E., Khan, S.A hybrid multijunction photoelectrode for hydrogen production fabricated with amorphous silicon/germanium and iron oxide thin films. Int. J. Hydrogen Energy 29, 907 (2004)CrossRefGoogle Scholar
3.Ingler, W.B. Jr., Sporar, D., Deng, X.Sputter deposition of In–Fe2O3 films for photoelectrochemical hydrogen production. State-of-the-Art Program on Compound Semiconductors 45 (SOTAPOCS 45)—and—Wide Bandgap Semiconductor Materials and Devices 7. ECS Trans. 3, 253 (2006)CrossRefGoogle Scholar
4.Miller, E.L., Paluselli, D., Marsen, B., Rocheleau, R.E.Development of reactively sputtered metal oxide films for hydrogen-producing hybrid multijunction photoelectrodes. Sol. Energy Mater. Sol. Cells 88, (2)131 (2005)CrossRefGoogle Scholar
5.Ingler, W.B. Jr., Ong, G., Deng, X.Rf sputter deposition of indium oxide–iron oxide films for photoelectrochemical hydrogen production. State-of-the-Art Program on Compound Semiconductors 49 (SOTAPOCS 49). ECS Trans. 16, 49 (2008)CrossRefGoogle Scholar
6.Deng, X., Xu, L. Integrated photoelectrochemical cell and system having a liquid electrolyte. U.S. Patent: US2005/0,211,290 A1 (29 Sept 2005)Google Scholar
7.Deng, X., Schiff, E.Amorphous silicon related solar cellsHandbook of Photovoltaic Engineering edited by A. Luque and S. Hegedus (John Wiley & Sons, Ltd. 2002)Google Scholar
8.Agarwal, P., Povolny, H., Han, S., Deng, X.Study of a-SiGe:H films and n–i–p devices used in high efficiency triple-junction solar cells. J. Non-Cryst. Solids 1213, 299 (2002)Google Scholar
9.Sporar, D.Sputter deposition of iron oxide and tin oxide based films and the fabrication of metal alloy based electrodes for solar hydrogen production M.S. Thesis University of Toledo (2007)Google Scholar