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Hardness and adhesive properties of (Cr, Mo) oxycarbide films on stainless steel via vapor deposition

Published online by Cambridge University Press:  31 January 2011

Ming-Hung Lo  and
Wen-Cheng J. Wei
Ming-Hung Lo
Affiliation:
Institute of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan 106, Republic of China
Wen-Cheng J. Wei
Affiliation:
Institute of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan 106, Republic of China
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Abstract

A hexacarbonyl of chromium and molybdenum [(Cr, Mo) (CO)6] was used as an oxycarbide source for the coating on stainless steel 304 (SS304) at temperatures from 175 °C to 450 °C. Hardness of the films was determined from a microindentation technique through a similar calculation after Thomas (1987). Intrinsic hardnesses of the films formed at low and medium temperatures were determined to be 8.61 and 2.75 GPa, respectively. Both of them are larger than that of SS304 substrate, 1.75 GPa. Adhesive strength of the films was measured by the scratching test. The results reveal that the adhesive strengths of the films formed at low, medium, and high temperatures are 2.8 N, 37.6 N, and 36.0 N, respectively. Two different fracture modes after scratching were found for the films obtained at various temperature regions. A spalling-off type or a deformation failure with many cracks and deformation bands beside the striation was found.

Type
Articles
Information
Journal of Materials Research , Volume 11 , Issue 11 , November 1996 , pp. 2895 - 2902
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1.Krautle, H., Rohle, H., Escoboea, A., and Benking, H., J. Electron. Mater. 12, 215 (1983).CrossRefGoogle Scholar
2.Mizuta, M., Iwamoto, T., Moriyama, F., Kawata, S., and Kukimoto, H., J. Cryst. Growth 68, 142 (1984).CrossRefGoogle Scholar
3.Plass, C., Heinecke, H., Kayser, O., Lüth, H., and Balk, P., J. Cryst. Growth 88, 455 (1988).CrossRefGoogle Scholar
4.Bunshah, R. F., in Deposition Technologies for Films and Coatings, edited by Bunshah, F. F. (Noyes Publications, Park Ridge, NJ, 1982), p. 4. .Google Scholar
5.Yee, K. K., in Protective Coatings for Metals by Chemical Vapor Deposition, International Metal Reviews No. 226 (The Metals Society and American Society for Metals).Google Scholar
6.Lo, M. H. and Wei, W. C., unpublished research.Google Scholar
7.Thomas, A., Surf. Eng. 3 (2), 117 (1987).CrossRefGoogle Scholar
8.Jonnson, B. and Hogmark, S., Thin Solid Films 114, 257 (1984).CrossRefGoogle Scholar