Hostname: page-component-78c5997874-dh8gc Total loading time: 0 Render date: 2024-11-09T22:53:05.085Z Has data issue: false hasContentIssue false

The growth of AuGa2 thin films on GaAs(001) to form chemically unreactive interfaces

Published online by Cambridge University Press:  31 January 2011

Jeffrey R. Lince
Affiliation:
Department of Chemistry and Biochemistry and Solid State Sciences Center, University of California, Los Angeles, California 90024
Tsai C. Thomas
Affiliation:
Department of Chemistry and Biochemistry and Solid State Sciences Center, University of California, Los Angeles, California 90024
Williams R. Stanley
Affiliation:
Department of Chemistry and Biochemistry and Solid State Sciences Center, University of California, Los Angeles, California 90024
Get access

Abstract

Thin AuGa2 films were grown by codeposition from separate Au and Ga evaporation sources on clean GaAs(001) substrates in ultrahigh vacuum, and were studied by Auger electron spectroscopy, electron energy-loss spectroscopy, low-energy electron diffraction, scanning electron microscopy, and x-ray diffractometry. The morphology and crystallinity of the AuGa2 were highly dependent upon the film deposition and annealing history. Films grown on room-temperature substrates were continuous, specular, and polycrystalline, but the dominant orientation was with the (001) planes of the crystallites parallel to the substrate surface. Annealing to temperatures between 300°and 480°C caused the film to break up and coalesce into rectangular crystallites, which were all oriented with (001) parallel to the surface. An anneal to 500°C, which is above the AuGa2 melting point, resulted in the formation of irregular polycrystalline islands of AuGa2 on the GaAs(001) substrate. No interface roughening or chemical reactions between the film and substrate or interface were observed for even the highest-temperature anneals.

Type
Articles
Copyright
Copyright © Materials Research Society 1986

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1Sinha, A. K. and Poate, J. M., in Thin Films-lnterdiffusion and Keocrions, edited by Poate, J. M., Tu, K. N., and Mayer, J. W. (Interscicnce, New York. 1978), Chap. 11.Google Scholar
2Brillson, L. J., Surf. Sci. Rep. 2, 123 (1982).Google Scholar
3Yoshiie, T., Bauer, C. L., and Milnes, A. G., Thin Solid Films 111, 149 (1984).CrossRefGoogle Scholar
4Guha, S., Arora, B. M., and Salvi, V. P., Solid State Electron. 20, 431 (1977).Google Scholar
5Lince, J. R. and Williams, R. S., Thin Solid Films 137, 251 (1986).Google Scholar
6Sebestyen, T., Mojzes, I., and Szigethy, D., Electron Lett. 16. 504 (1980).Google Scholar
7Leung, S., Yoshiie, T., Uauer, C. I., and Milncs, A. G., J. Electrochem. Soc. 132, 898 (1985).Google Scholar
8Lince, J. R. and Williams, K. S., J. Vac. Sci. Technol. R 3, 1217 (1985).Google Scholar
9Drahten, P., Ranke, W., and Jacobi, K., Surf. Sci. 77, L162 (1978).Google Scholar
10Ludeke, K. and Koma, A., J. Vac. Sci. Technol. 13, 241 (1976).Google Scholar
11Nelson, J. G., Lince, J. K., Gignac, W. J., and Williams, R. S., J. Vac. Sci. Technol. A 2, 534 (1984).Google Scholar
12Chye, P. W., Lindau, I., Pianetta, P., Garner, C. M., Su, C. Y., and Spicer, W. E., Phys. Rev. B 18, 5545 (1978).Google Scholar
13Tsai, C. T. and Williams, R. S., J. Mater. Res. 1, 352 (1986).Google Scholar
14Lichterand, B. D.Sommelet, P., Trans. Metall. SOC. AIME 245, 1021 (1969).Google Scholar
15Ludekc, R., IBM J. Res. Dev. 22, 304 (1978).Google Scholar
16Cooke, C. J. and Rothery, W. Hume, J. Less-Common Met. 10, 42 (1966).Google Scholar
17Pugh, J. H. and Williams, R. S., J. Mater. Res. 1, 343 (1986).Google Scholar