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Growth behavior and microstructure of oxide scale formed on MoSi2 coating at 773 K

Published online by Cambridge University Press:  01 October 2004

Kyung-Hwan Lee ,
Jin-Kook Yoon ,
Gyeung-Ho Kim ,
Jung-Mann Doh ,
Kyung-Tae Hong  and
Woo-Young Yoon
Kyung-Hwan Lee
Affiliation:
Division of Materials and Engineering, Korea University, Sungbuk-ku, Seoul 136-701, Republic of Korea
Jin-Kook Yoon*
Affiliation:
Metal Processing Research Center, Korea Institute of Science and Technology, Cheongryang,Seoul 130-650, Republic of Korea
Gyeung-Ho Kim
Affiliation:
Nano-Materials Research Center, Korea Institute of Science and Technology, Cheongryang,Seoul 130-650, Republic of Korea
Jung-Mann Doh
Affiliation:
Metal Processing Research Center, Korea Institute of Science and Technology, Cheongryang,Seoul 130-650, Republic of Korea
Kyung-Tae Hong
Affiliation:
Metal Processing Research Center, Korea Institute of Science and Technology, Cheongryang,Seoul 130-650, Republic of Korea
Woo-Young Yoon
Affiliation:
Division of Materials and Engineering, Korea University, Sungbuk-ku, Seoul 136-701, Republic of Korea
*
a) Address all correspondence to this author.e-mail: [email protected]
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Abstract

Growth behavior and microstructure of oxide scale formed on MoSi2 coating by cyclic oxidation testing in air at 500 °C were investigated using field emission scanning electron microscopy, cross-sectional transmission electron microscopy, glancing angle x-ray diffraction, and x-ray photoelectron spectroscopy. MoSi2 coating was prepared by chemical vapor deposition of Si on a Mo substrate at 1100 °C for 5 h using SiCl4–H2 precursor gas mixtures. After the incubation period of about 454 cycles, accelerated oxidation behavior was observed in MoSi2 coating and the weight gain increased linearly with increasing oxidation cycles. Microstructural analyses revealed that pest oxide scale was formed in three sequential processes. Initially, nanometer-sized crystalline Mo4O11 particles were formed with an amorphous SiO2 matrix at MoSi2 interface region. Inward diffusing oxygen reacted with Mo4O11 to form Mo9O26 nano-sized particles. At final stage of oxidation, MoO3 was formed from Mo9O26 with oxygen and growth of MoO3 took place forming massive precipitates with irregular and wavy shapes. The internal stress caused by the growth of massive MoO3 precipitates and the volatilization of MoO3 was attributed to the formation of many lateral cracks into the matrix leading to pest oxidation of MoSi2 coating.

Keywords

Chemical vapor deposition (CVD)Microstructure
Type
Articles
Information
Journal of Materials Research , Volume 19 , Issue 10 , October 2004 , pp. 3009 - 3018
Copyright
Copyright © Materials Research Society 2004

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