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Formation mechanisms and atomic configurations of nitride phases at the interface of aluminum nitride and titanium

Published online by Cambridge University Press:  31 January 2011

Chia-Hsiang Chiu
Affiliation:
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30050, Taiwan
Chien-Cheng Lin*
Affiliation:
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30050, Taiwan
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Aluminum nitride was bonded with a titanium foil at 1400 °C for up to 1 h in Ar. The AlN/Ti interfacial reactions were investigated using analytical electron microscopy. Reaction layers, consisting of δ-TiN, τ2-Ti2AlN, γ-TiAl, α2-Ti3Al, a two-phase region (α2-Ti3Al + α-Ti), and α-Ti (Al, N) solid solution, were observed after annealing at 1400 °C for 0.1 h. Among these phases, the α2-Ti3Al and (α2-Ti3Al + α-Ti) were formed during cooling. Further diffusion of N atoms into the reaction zone precipitates a chopped fiber-like α2-Ti2AlN in the matrix of γ-TiAl, with [110]γ−TiAl//[11¯20]τ2−Ti2AlN and (1¯1¯1)γ−TiAl//(1¯10¯3)τ2−Ti2AlN, by substituting N atoms for one-half Al atoms after annealing at 1400 °C for 1 h. The released Al atoms, due to the precipitation of τ2-Ti2AlN, resulted in an ordered Al-rich γ-TiAl or Ti3Al5. Furthermore, the α-Ti (Al, N) was nitridized into a lamellar layer (δ-TiN + α-Ti) with [110]δ−TiN//[11¯20]α−Ti and (111)δ−TiN//(0001)α−Ti.

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Articles
Copyright
Copyright © Materials Research Society 2008

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References

REFERENCES

1Paransky, Y., Berner, A., Gotman, I.: Microstructure of reaction zone at the Ti-AlN interface. Mater. Lett. 40, 180 1999CrossRefGoogle Scholar
2Paransky, Y., Gotman, I., Gutmanas, E.Y.: Reactive phase formation at AlN–Ti and AlN–TiAl interfaces. Mater. Sci. Eng., A 277, 83 2000CrossRefGoogle Scholar
3Paransky, Y., Klinger, L., Gotman, I.: Kinetics of two-phase layer growth during reactive diffusion. Mater. Sci. Eng., A 270, 231 1999CrossRefGoogle Scholar
4Paransky, Y., Berner, A., Gotman, I., Gutmanas, E.: Phase recognition in AlN–Ti system by energy dispersive spectroscopy and electron backscatter diffraction. Mikrochim. Acta 134, 171 2000CrossRefGoogle Scholar
5Pinkas, M., Frage, N., Froumin, N., Pelleg, J., Dariel, M.P.: Early stages of interface reactions between AlN and Ti thin films. J. Vac. Sci. Technol. 20, 887 2002CrossRefGoogle Scholar
6Nakahata, S., Sogabe, K., Matsuura, T., Yamakawa, A.: One role of titanium compound particles in aluminum nitride sintered body. J. Mater. Sci. 32, 1873 1997CrossRefGoogle Scholar
7Imanaka, Y., Notis, M.R.: Interfacial reaction between titanium thin films and aluminum nitride substrates. J. Am. Ceram. Soc. 82, 1547 1999CrossRefGoogle Scholar
8Yasumoto, T., Amakawa, K., Iwase, N., Shinsawa, N.: Reaction between AlN and metal thin films during high temperature annealing. J. Ceram. Soc. Jpn. 101, 969 1993CrossRefGoogle Scholar
9El-Sayed, M.H., Naka, M., Schuster, J.C.: Interfacial structure and reaction mechanism of AlN/Ti joints. J. Mater. Sci. 32, 2715 1997CrossRefGoogle Scholar
10Chiu, C.H., Lin, C.C.: Microstructural characterization and phase development at the interface between aluminum nitride and titanium after annealing at 1300°–1500 °C. J. Am. Ceram. Soc. 89, 1409 2006CrossRefGoogle Scholar
11Zhao, B., Sun, J., Wu, J.S., Yuan, Z.X.: Gas nitriding behavior of TiAl based alloys in an ammonia Atmosphere. Scr. Mater. 46, 581 2002CrossRefGoogle Scholar
12Tian, W.H., Nemoto, M.: Precipitation behavior of nitrides in L10-ordered TiAl. Intermetallics 13, 1030 2005CrossRefGoogle Scholar
13Pivin, J.C., Zheng, P., Ruault, M.O.: Transmission electron microscopy investigation of the structural transformations in titanium or TiAl implanted with nitrogen, carbon, oxygen and boron. Mater. Sci. Eng., A 115, 83 1989CrossRefGoogle Scholar
14Kloosterman, A.B., Hosson, J.T.M.D.: Microstructural characterization of laser nitrided titanium. Scr. Metall. Mater. 33, 567 1995CrossRefGoogle Scholar
15Saito, K., Matsushima, T.: Nitrogen ion implantation into the intermetallic compound TiAl. Mater. Sci. Eng., A 115, 355 1989CrossRefGoogle Scholar
16Cliff, G., Lorimer, G.W.: The quantitative analysis of thin specimens. J. Microsc. 103, 203 1975CrossRefGoogle Scholar
17Chen, Q., Sundman, B.: Thermodynamic assessment of the Ti–Al–N system. J. Phase Equilib. 19, 146 1998CrossRefGoogle Scholar
18Murray, J.L.: Phase Diagrams of Binary Titanium Alloys ASM International Metals Park, OH 1987Google Scholar
19Inoue, M., Nunogaki, M., Suganuma, K.: Chemical reaction of TiAl intermetallics with a nitrogen plasma. J. Solid State Chem. 157, 339 2001CrossRefGoogle Scholar
20Villars, P., Calvert, L.D.: Pearson’s Handbook of Crystallographic Data for Intermetallic Phases ASM International Materials Park, OH 1991Google Scholar
21Doi, M., Koyama, T., Taniguchi, T., Naito, S.: Morphological changes of the Ti3Al5 phase formed by phase-decomposition of TiAl intermetallics. Mater. Sci. Eng., A 329–331, 891 2002CrossRefGoogle Scholar
22Sattonnay, G., Dimitrov, O.: Long-range order relaxation and phase transformation in γ-TiAl alloys. Acta Mater. 47, 2077 1999CrossRefGoogle Scholar
23Nakano, T., Negishi, A., Hayashi, K., Umakoshi, Y.: Ordering process of Al5Ti3, h-Al2Ti and r-Al2Ti with f.c.c.-based long-period superstructures in rapidly solidified Al-rich TiAl alloys. Acta Mater. 47, 1091 1999CrossRefGoogle Scholar
24Fu, C.L., Yoo, M.H.: Bonding mechanisms and point defects in TiAl. Intermetallics 1, 59 1993CrossRefGoogle Scholar
25Swaminathan, S., Jones, I.P., Johnson, A.W.S., Fraser, H.L.: Debye–Waller factors in off-stoichiometric TiAl: Effect of ordering of excess Al atoms on Ti sites. Philos. Mag. Lett. 73, 319 1996CrossRefGoogle Scholar
26Vujic, D., Li, Z., Whang, S.H.: Effect of rapid solidification and alloying addition on lattice distortion and atomic ordering in L10 TiAl alloys and their ternary alloys. Metall. Trans. A 19, 2445 1988CrossRefGoogle Scholar
27Lu, W., Chen, C.L., Wang, F.H., Lin, J.P., Chen, G.L., He, L.L.: Phase transformation in the nitride layer during the oxidation of TiAl-based alloys. Scripta Mater. 56, 773 2007CrossRefGoogle Scholar
28Yu, R., Zhang, S., He, L.L., Wu, W.T., Ye, H.Q.: Metal/ceramic interface in an in situ synthesized Ti/TiCP composite coating by laser processing. J. Mater. Res. 16, 9 2001CrossRefGoogle Scholar
29Lin, Z.J., Zhuo, M.J., Zhou, Y.C., Li, M.S., Wang, J.Y.: Microstructural characterization of layered ternary Ti2AlC. Acta Mater. 54, 1009 2006CrossRefGoogle Scholar