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Fabrication of microchannel arrays in borophosphosilicate glass

Published online by Cambridge University Press:  01 March 2005

Claire L. Callender ,
Christopher J. Ledderhof ,
Patrick Dumais ,
Chantal Blanchetière  and
Julian P. Noad
Claire L. Callender*
Affiliation:
Communications Research Centre, Ottawa, Ontario, Canada K2H 8S2
Christopher J. Ledderhof
Affiliation:
Communications Research Centre, Ottawa, Ontario, Canada K2H 8S2
Patrick Dumais
Affiliation:
Communications Research Centre, Ottawa, Ontario, Canada K2H 8S2
Chantal Blanchetière
Affiliation:
Communications Research Centre, Ottawa, Ontario, Canada K2H 8S2
Julian P. Noad
Affiliation:
Communications Research Centre, Ottawa, Ontario, Canada K2H 8S2
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Two-dimensional arrays of embedded channels with cross-sectional diameters of 1–3 μm were fabricated in silica-on-silicon thin film structures. The channel arrays were fabricated using void-forming borophosphosilcate glass (BPSG) deposited by plasma-enhanced chemical vapor deposition (PECVD) over templates patterned and etched using standard photolithographic methods and reactive ion etching. The sizeand shape of the channels could be controlled by adjusting the depth, width, and spacing of the template ridges, the dopant levels in the BPSG, and the annealing conditions. Optimization of the channel fabrication process through detailed investigation of the process variables is presented. Potential applications inphotonics, sensors, and microfluidics are discussed.

Keywords

GlassMicrostructurePlasma-enhanced CVD (PECVD)
Type
Articles
Information
Journal of Materials Research , Volume 20 , Issue 3 , March 2005 , pp. 759 - 764
Copyright
Copyright © Materials Research Society 2005

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