Hostname: page-component-78c5997874-s2hrs Total loading time: 0 Render date: 2024-11-04T19:47:26.513Z Has data issue: false hasContentIssue false
  • English
  • Français

The effects of UV laser irradiation on the filament-assisted deposition of diamond

Published online by Cambridge University Press:  31 January 2011

F. G. Celii ,
H. H. Nelson  and
P. E. Pehrsson
F. G. Celii
Affiliation:
Chemistry Division, Code 6174, Naval Research Laboratory, Washington, DC 20375-5000
H. H. Nelson
Affiliation:
Chemistry Division, Code 6174, Naval Research Laboratory, Washington, DC 20375-5000
P. E. Pehrsson
Affiliation:
Chemistry Division, Code 6174, Naval Research Laboratory, Washington, DC 20375-5000
Get access

Abstract

The effects of 193 and 308 nm excimer laser radiation on the filament-assisted chemical vapor deposition (CVD) of diamond were investigated, in attempts to reproduce and quantify the reported mechanism of laser-enhanced diamond deposition. The deposited materials were analyzed using optical microscopy, SEM, scanning Auger microprobe, and micro-Raman scattering. With fluence levels of >50 mJ · cm−2, UV laser irradiation was found to suppress rather than enhance the quantity of diamond deposition. The size, morphology, and Raman spectra of crystallites in the irradiated regions were nearly identical to those in adjacent unirradiated regions of the same sample. An additional laser-induced effect was a region of enhanced etching on the Si substrate, which appeared as a “shadowing” of the diamond crystallites. The results are interpreted in terms of a laser-induced depletion of diamond nucleation sites, and suggest a new method for patterning of CVD films.

Type
Diamond and Diamond-Like Materials
Information
Journal of Materials Research , Volume 5 , Issue 11 , November 1990 , pp. 2337 - 2344
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Angus, J.C. and Hayman, C.C., Science 241, 913 (1988).CrossRefGoogle Scholar
2Rothschild, M., Amone, C., and Ehrlich, D. J., J. Vac. Sci. Technol. B 4, 310 (1986).CrossRefGoogle Scholar
3Hirabayashi, K., Taniguchi, Y., Takamatsu, O., Ikeda, T., Ikoma, K., and Iwasaki-Kurihara, N., Appl. Phys. Lett. 53, 1815 (1988).CrossRefGoogle Scholar
4Ma, J.S., Kawarada, H., Yonehara, T., Suzuki, J-I., Wei, J., Yokota, Y., and Hiraki, A., Appl. Phys. Lett. 55, 1071 (1989).CrossRefGoogle Scholar
5Kobashi, K., Miyata, K., Kumagai, K., Nakaue, A., Tachibana, H., Inoue, T., and Kawate, Y., Proc. 1st Int. Symp. on Diamond and Diamond-Like Films, edited by Dismukes, J. P., Purdes, A. J., Spear, K. E., Meyerson, B. S., Ravi, K.V., Moustakas, T. D., and Yoder, M. (The Electrochemical Society, 1988), Vol. 89–12, p. 139.Google Scholar
6Kitihama, K., Hirata, K., Nakamatsu, H., Kawai, S., Fujimori, N., Imai, T., Yoshino, H., and Doi, A., Appl. Phys. Lett. 49, 634 (1986);CrossRefGoogle Scholar
Kitihama, K., Hirata, K., Nakamatsu, H., Kawai, S., Fujimori, N., and Imai, T., in Photon, Beam and Plasma Stimulated Chemical Processes at Surfaces, edited by Donnelly, V. M., Herman, I. P., and Hirose, M. (Mater. Res. Soc. Symp. Proc. 75, Pittsburgh, PA, 1987), p. 309.Google Scholar
7Kitihama, K., Appl. Phys. Lett. 53, 1812 (1988); Erratum, Katsuki Kitahama, Kazuhiko Hirata, Hirohide Nakamatsu, Shichio Kawai, Naoji Fujimori, Takahiro Imai, Hiroshi Yoshino, and Akira Doi.CrossRefGoogle Scholar
8Goto, Y., Yagi, T., and Nagai, H., in Laser and Particle-Beam Modification of Chemical Processes on Surfaces, edited by Johnson, A.W., Loper, G. L., and Sigmon, T.W. (Mater. Res. Soc. Symp. Proc. 129, Pittsburgh, PA, 1989), p. 213.Google Scholar
9Matsumoto, O., Toshima, H., and Kanzaki, Y., Thin Solid Films 128, 341 (1985).CrossRefGoogle Scholar
10Saito, Y., Sato, K., Tanaka, H., Fujita, K., and Matilda, S., J. Mater. Sci. 23, 842 (1988).CrossRefGoogle Scholar
11Oakes, D. B., Butler, J. E., Snail, K. A., Carrington, W. A., and Hanssen, L. M., J. Appl. Phys. (in press).Google Scholar
12Galuska, A. A., Madden, H.H., and Allied, R.E., Appl. Surf. Sci. 32, 253 (1988).CrossRefGoogle Scholar
13Celii, F.G., Johnson, R. D. III, Butler, J. E., and Hudgens, J.W., unpublished work.Google Scholar
14Celii, F. G., Pehrsson, P.E., Wang, H-t., and Butler, J.E., Appl. Phys. Lett. 52, 2053 (1988).CrossRefGoogle Scholar
15Gordon, S. and McBride, B. J., Computer Program for Chemical Equilibrium Calculations, NASA-Lewis Research Center, NASA SP-273, March 1976.Google Scholar
16Calvert, J. G. and Pitts, J. N., Photochemistry (J. Wiley & Sons, Inc., New York, 1966).Google Scholar
17Bechtel, J. H., J. Appl. Phys. 46, 1585 (1975).CrossRefGoogle Scholar
18Harris, S. J. and Belton, D. N., J. Appl. Phys. 66, 4223 (1989).CrossRefGoogle Scholar
19Belton, D. N., Harris, S. J., Schmieg, S. J., Weiner, A. M., and Perry, T. A., Appl. Phys. Lett. 54, 416 (1989).CrossRefGoogle Scholar