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Deposition of molybdenum carbonitride thin films from Mo(NBut)2(NHBut)2

Published online by Cambridge University Press:  03 March 2011

Hsin-Tien Chiu ,
Wen-Yu Ho  and
Shiow-Huey Chuang
Hsin-Tien Chiu
Affiliation:
Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan 30050, Republic of China
Wen-Yu Ho
Affiliation:
Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan 30050, Republic of China
Shiow-Huey Chuang
Affiliation:
Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan 30050, Republic of China
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Abstract

Mo(NBut)2(NHBu1)2 is used as a single-source precursor to deposit thin films of cubic phase molybdenum carbonitride, MoCxNy (x: 0.2-0.55, y: 0.1-0.47), by chemical vapor deposition on silicon substrates. In general, the C/Mo ratios increased from 0.2 to 0.55 and the N/Mo ratios decreased from 0.47 to 0.1 with increasing the temperature of deposition from 773 to 923 K. Based on the elemental composition and the composition of the gas phase products, it is proposed that the carbon atoms were incorporated through β-methyl activation of the ligands.

Type
Rapid Communications
Information
Journal of Materials Research , Volume 9 , Issue 7 , July 1994 , pp. 1622 - 1624
Copyright
Copyright © Materials Research Society 1994

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References

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