Hostname: page-component-cd9895bd7-dzt6s Total loading time: 0 Render date: 2024-12-18T21:43:32.416Z Has data issue: false hasContentIssue false

Density modulated nanoporous tungsten thin films and their nanomechanical properties

Published online by Cambridge University Press:  06 June 2016

Tanil Ozkan
Affiliation:
Department of Mechanical Engineering, Texas A&M University, College Station, TX 77843, USA
Muhammed T. Demirkan
Affiliation:
Department of Physics & Astronomy, University of Arkansas at Little Rock, Little Rock, AR 72204, USA
Kathleen A. Walsh
Affiliation:
Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61820, USA
Tansel Karabacak
Affiliation:
Department of Physics & Astronomy, University of Arkansas at Little Rock, Little Rock, AR 72204, USA
Andreas A. Polycarpou*
Affiliation:
Department of Mechanical Engineering, Texas A&M University, College Station, TX 77843, USA
*
a) Address all correspondence to this author. e-mail: [email protected]
Get access

Abstract

Density modulated tungsten (W) thin films with nanoscale porosity contents of 7% to 40% by volume were grown on Si substrates through magnetron sputter deposition. Process parameters were selected according to the structure zone model, which resulted in film thicknesses between 105 nm and 520 nm. Nanomechanical properties of samples were investigated by means of instrumented nanoindentation. Reduced-χ2 analysis was carried out to assess four models formulated through differential effective medium approach. The model that factored in both the crowding effect and the maximum random packing of pores successfully captured the experimental trends. Attempts to breach the auxetic barrier resulted in large-scale pulverization or spontaneous conversion into WO3. Porosity corrected yield strength calculations underlined the possibility of defining a porosity threshold beyond which the compressive yield strength of density modulated nanoporous metallic thin films would drop abruptly due to aggravated geometric slenderness effects in agreement with earlier hypotheses.

Type
Articles
Copyright
Copyright © Materials Research Society 2016 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Footnotes

b)

Present address: Materials Science and Engineering Department, Gebze Technical University, Kocaeli, 41400, Turkey.

Contributing Editor: Yang-T. Cheng

References

REFERENCES

Singh, J.P., Karabacak, T., Ye, D.X., Liu, D.L., Picu, R.C., Lu, T.M., and Wang, G.C.: Physical properties of nanostructures grown by oblique angle deposition. J. Vac. Sci. Technol., B 23(5), 2114 (2005).Google Scholar
Thornton, J.A.: High rate thick film growth. Annu. Rev. Mater. Sci. 7, 239 (1977).Google Scholar
Thornton, J.A.: The microstructure of sputter-deposited coatings. J. Vac. Sci. Technol., A 4(6), 3059 (1986).Google Scholar
Meyer, D.C., Klingner, A., Holz, T., and Paufler, P.: Self-organized structuring of W/C multilayers on Si substrate. Appl. Phys. A: Mater. Sci. Process. 69(6), 657 (1999).Google Scholar
Freund, L.B. and Suresh, S.: Thin Film Materials: Stress, Defect Formation and Surface Evolution, 1st ed. (Cambridge University Press, Cambridge, England, 2004); pp. 6072.Google Scholar
Haghiri-Gosnet, A.M., Ladan, F.R., Mayeux, C., Launois, H., and Joncour, M.C.: Stress and microstructure in tungsten sputtered thin films. J. Vac. Sci. Technol., A 7(4), 2663 (1989).Google Scholar
Windischmann, H.: Intrinsic stress in sputtered thin films. J. Vac. Sci. Technol., A 9(4), 2431 (1991).CrossRefGoogle Scholar
Haghiri-Gosnet, A.M., Ladan, F.R., Mayeux, C., and Launois, H.: Stresses in sputtered tungsten thin films. Appl. Surf. Sci. 38(1–4), 295 (1989).Google Scholar
Yonezawa, M., Yamazaki, T., and Kikuta, T.: Porosity Assessment of NiO sputtered film and NO2 sensing property. J. Vac. Soc. Jpn. 53(3), 226 (2010).Google Scholar
Ren, D., Zou, Y., Zhan, C.Y., and Huang, N.K.: Study on the porosity of TiO2 films prepared by using magnetron sputtering deposition. J. Korean Phys. Soc. 58(4), 883 (2011).Google Scholar
Messier, R., Giri, A.P., and Roy, R.A.: Revised structure zone model for thin film physical structure. J. Vac. Sci. Technol., A 2(2), 500 (1984).Google Scholar
Karabacak, T., Picu, C.R., Senkevich, J.J., Wang, G.C., and Lu, T.M.: Stress reduction in tungsten films using nanostructured compliant layers. J. Appl. Phys. 96(10), 5740 (2004).Google Scholar
Karabacak, T., Senkevich, J.J., Wang, G.C., and Lu, T.M.: Stress reduction in sputter deposited films using nanostructured compliant layers by high working-gas pressures. J. Vac. Sci. Technol., A 23(4), 986 (2005).Google Scholar
Hutchinson, J.W.: Mechanics of Thin Films and Multilayers: Course Notes (Technical University of Denmark, Technical Report, 1996).Google Scholar
Ohring, M.: Materials Science of Thin Films, 2nd ed. (Academic Press, San Diego, CA, 2002); pp. 641742.Google Scholar
Evans, A.G. and Hutchinson, J.W.: The thermomechanical integrity of thin films and multilayers. Acta Metall. Mater. 43, 2507 (1995).Google Scholar
Petrov, I., Barna, P., Hultman, L., and Greene, J.: Microstructural evolution during film growth. J. Vac. Sci. Technol., A 21, S117 (2003).Google Scholar
Smith, D.L.: Thin-Film Deposition: Principles and Practice, 1st ed. (McGraw-Hill Professional, New York, NY, 1995); pp. 307318.Google Scholar
Karabacak, T., Zhao, Y.P., Wang, G.C., and Lu, T.M.: Growth front roughening in amorphous silicon films by sputtering. Phys. Rev. B 64(8), 085323 (2001).Google Scholar
Liu, R. and Antoniou, A.: A relationship between the geometrical structure of a nanoporous metal foam and its modulus. Acta Mater. 61(7), 2390 (2013).Google Scholar
Lu, C., Shun, X., and Lewis, O.: Investigation of film-thickness determination by oscillating quartz resonators with large mass load. J. Appl. Phys. 43(11), 4385 (1972).Google Scholar
Demirkan, M.T., Trahey, L., and Karabacak, T.: Cycling performance of density modulated multilayer silicon thin film anodes in Li-ion batteries. J. Power Sources 273(6), 52 (2015).Google Scholar
Oliver, W.C. and Pharr, G.M.: An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments. J. Mater. Res. 7(4), 1564 (1992).Google Scholar
Fischer-Cripps, A.C.: Nanoindentation, 3rd ed. (Springer, New York, NY, 2011); pp. 129.Google Scholar
Pal, R.: Porosity-dependence of effective mechanical properties of pore–solid composite materials. J. Compos. Mater. 39(13), 1147 (2005).Google Scholar
Chatterjee, A., Kumar, N., Abelson, J.R., Bellon, P., and Polycarpou, A.A.: Nanoscratch and nanofriction behavior of hafnium diboride thin films. Wear 265, 921 (2008).Google Scholar
Meier, P.C. and Zund, R.E.: Statistical Methods in Analytical Chemistry, 2nd ed. (John Wiley & Sons, New York, NY, 2000); p. 76.Google Scholar
Lassner, E. and Schubert, W-D.: Tungsten: Properties, Chemistry, Technology of the Element, Alloys, and Chemical Compounds, 1st ed. (Kluwer Academic/Plenum Publishers, New York, NY, 1999); pp. 1185.Google Scholar
Shih, K.K., Smith, D.A., and Crow, J.R.: Properties of hard tungsten films prepared by sputtering. J. Vac. Sci. Technol. A 6(3), 1681 (1988).Google Scholar
Bernardini, J. and Beke, D.L.: Diffusion in nanomaterials. In Nanocrystallinen Metals and Oxides, 1st ed., Knauth, P. and Schoonman, J. eds.; Kluwer Academic Publishers: Dordrecht, The Netherlands, 2002; pp. 4179.Google Scholar
Ozkan, T., Shaddock, D., Lipkin, D.M., and Chasiotis, I.: Mechanical strengthening, stiffening, and oxidation behavior of pentatwinned Cu nanowires at near ambient temperatures. Mater. Res. Express 1(3), 035020035021 (2014).Google Scholar
Warren, A., Nylund, A., and Olefjord, I.: Oxidation of tungsten and tungsten carbide in dry and humid atmospheres. Int. J. Refract. Met. Hard Mater. 14, 345 (1996).Google Scholar
Huth, F., Schnell, M., Wittborn, J., Ocelic, N., and Hillenbrand, R.: Infrared-spectroscopic nanoimaging with a thermal source. Nat. Mater. 10, 352 (2011).Google Scholar
Li, C., Hsieh, J.H., Hung, M-T., and Huang, B.Q.: The deposition and microstructure of amorphous tungsten oxide films by sputtering. Vacuum 118, 125 (2015).Google Scholar
Bower, A.F.: Applied Mechanics of Solids, 1st ed. (CRC Press, Boca Raton, FL, 2010); pp. 8587.Google Scholar
Li, Y. and Antoniou, A.: Synthesis of transversely isotropic nanoporous platinum. Scr. Mater. 66, 503 (2012).Google Scholar
Jensen, M.O. and Brett, M.J.: Porosity engineering in glancing angle deposition thin films. Appl. Phys. A 80(4), 763 (2005).Google Scholar
Ding, Y. and Zhang, Z.: Nanoporous metals. In Springer Handbook of Nanomaterials, 1st ed., Vajtai, R. ed.; Springer Science: New York, NY, 2013; pp. 799802.Google Scholar
Wang, L.: Structural tailoring of nanoporous metals and study of their mechanical behavior (University of Kentucky Theses and Dissertations in Chemical and Materials Engineering, Louisville, KY, 2013); pp. 5131.Google Scholar
Ma, C., Wang, S.C., Wood, R.J.K., Zekonyte, J., Luo, Q., and Walsh, F.C.: Hardness of porous nanocrystalline Co–Ni electrodeposits. Met. Mater. Int. 19(6), 1187 (2013).Google Scholar
Huber, N., Viswanath, R.N., Mameka, N., Markmann, J., and Weissmuller, J.: Scaling laws of nanoporous metals under uniaxial compression. Acta Mater. 67, 252 (2014).Google Scholar
Johnson, K.L.: Contact Mechanics, 1st ed. (Cambridge University Press, Cambridge, England, 2001); pp. 171179.Google Scholar
Lee, K.M., Yeo, C-D., and Polycarpou, A.A.: Relationship between scratch hardness and yield strength of elastic perfectly plastic materials using finite element analysis. J. Mater. Res. 23(8), 2229 (2008).Google Scholar
Giri, A., Tao, J., Kirca, M., and To, A.C.: Mechanics of nanoporous metals. In Handbook of Micromechanics and Nanomechanics, 1st ed., Li, S. and Gao, X-L. eds.; Pan Stanford Publishing: Singapore, Singapore, 2013; pp. 827867.Google Scholar
Sun, X-Y., Xu, G-K., Li, X., Feng, X-Q., and Gao, H.: Mechanical properties and scaling laws of nanoporous gold. J. Appl. Phys. 113, 023505- 1 (2013).Google Scholar
Hodge, A.M., Biener, J., Hayes, J.R., Bythrow, P.M., Volkert, C.A., and Hamza, A.V.: Scaling equation for yield strength of nanoporous open-cell foams. Acta Mater. 55, 1343 (2007).Google Scholar
Lydzba, D. and Shao, J.F.: Modeling of plastic deformation of saturated porous materials: Effective stress concept. In Applied Micromechanics of Porous Materials, 1st ed., Dormieux, L. and Ulmedited, F-J. eds.; Springer: Udine, Italy, 2005; pp. 187204.Google Scholar