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A critical review of the effects of fluid dynamics on graphene growth in atmospheric pressure chemical vapor deposition

Published online by Cambridge University Press:  08 March 2018

Fatin Bazilah Fauzi Open the ORCID record for Fatin Bazilah Fauzi [Opens in a new window] ,
Edhuan Ismail ,
Mohd Hanafi Ani ,
Syed Noh Syed Abu Bakar ,
Mohd Ambri Mohamed ,
Burhanuddin Yeop Majlis ,
Muhamad Faiz Md Din  and
Mohd Asyadi Azam Mohd Abid
Fatin Bazilah Fauzi
Affiliation:
Department of Manufacturing and Materials Engineering, International Islamic University Malaysia (IIUM), Kuala Lumpur 53100, Malaysia
Edhuan Ismail
Affiliation:
Department of Manufacturing and Materials Engineering, International Islamic University Malaysia (IIUM), Kuala Lumpur 53100, Malaysia
Mohd Hanafi Ani*
Affiliation:
Department of Manufacturing and Materials Engineering, International Islamic University Malaysia (IIUM), Kuala Lumpur 53100, Malaysia
Syed Noh Syed Abu Bakar
Affiliation:
Department of Mechanical Engineering, International Islamic University Malaysia (IIUM), Kuala Lumpur 53100, Malaysia
Mohd Ambri Mohamed
Affiliation:
Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, UKM-Bangi 43600, Selangor, Malaysia
Burhanuddin Yeop Majlis
Affiliation:
Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, UKM-Bangi 43600, Selangor, Malaysia
Muhamad Faiz Md Din
Affiliation:
Department of Electrical and Electronics Engineering, Universiti Pertahanan Nasional Malaysia (UPNM), Kuala Lumpur 57000, Malaysia
Mohd Asyadi Azam Mohd Abid
Affiliation:
Faculty of Manufacturing Engineering, Universiti Teknikal Malaysia Melaka (UTEM), Durian Tunggal 76100, Melaka, Malaysia
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

Chemical vapor deposition (CVD) of graphene has attracted high interest in the electronics industry due to its potential scalability for large-scale production. However, producing a homogeneous thin-film graphene with minimal defects remains a challenge. Studies of processing parameters, such as gas precursors, flow rates, pressures, temperatures, and substrate types, focus on improving the chemical aspect of the deposition. Despite the many reports on such parameters, studies on fluid dynamic aspects also need to be considered since they are crucial factors in scaling up the system for homogenous deposition. Once the deposition kinetics is thoroughly understood, the next vital step is fluid dynamics optimization to design a large-scale system that could deliver the gas uniformly and ensure maximum deposition rate with the desired property. In this review, the influence of fluid dynamics in graphene CVD process was highlighted. The basics and importance of CVD fluid dynamics was introduced. It is understood that the fluid dynamics of gases can be controlled in two ways: via reactor modification and gas composition. This paper begins first with discussions on horizontal tubular reactor modifications. This is followed by mechanical properties of the reactant gasses especially in terms of dimensionless Reynolds number which provides information on gas flow regime for graphene CVD process at atmospheric pressure. Data from the previous literature provide the Reynolds number for various gas compositions and its relation to graphene quality. It has been revealed that hydrogen has a major influence on the fluid dynamic conditions within the CVD, hence affecting the quality of the graphene produced. Focusing on atmospheric pressure CVD, suggestions for up-scaling into larger CVD reactors while maintaining similar fluid properties were also provided.

Keywords

chemical vapor deposition (CVD) (deposition)fluidthin film
Type
REVIEW
Information
Journal of Materials Research , Volume 33 , Issue 9: Focus Issue: Porous Carbon and Carbonaceous Materials for Energy Conversion and Storage , 14 May 2018 , pp. 1088 - 1108
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Copyright
Copyright © Materials Research Society 2018 

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Footnotes

Contributing Editor: Tianyu Liu

This section of Journal of Materials Research is reserved for papers that are reviews of literature in a given area.

References

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