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Chemical sensors based on dielectric response of functionalized mesoporous silica films

Published online by Cambridge University Press:  31 January 2011

Karel Domansky ,
Jun Liu ,
Li-Qiong Wang ,
Mark H. Engelhard  and
Suresh Baskaran
Karel Domansky
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
Jun Liu
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
Li-Qiong Wang
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
Mark H. Engelhard
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
Suresh Baskaran*
Affiliation:
Pacific Northwest National Laboratory, P.O. Box 999, MS K2–44, Richland, Washington 99352
*
b)Address all correspondence to this author.[email protected]
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Abstract

Dielectric response of mesoporous silica films was monitored as a function of several gas-phase chemical species. The effects of humidity, ammonia, and methane on dielectric constant and dissipation factor of films subjected to different chemical treatments are described. Dielectric constant and dissipation factor of partially dehydroxylated films were found to be highly sensitive to both water vapor and ammonia in air. The capacitive devices based on mesoporous silica films show potential for use in chemical sensors.

Type
Articles
Information
Journal of Materials Research , Volume 16 , Issue 10 , October 2001 , pp. 2810 - 2816
Copyright
Copyright © Materials Research Society 2001

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References

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