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Wavelength Dependence of Crystallization of Alkoxy-Derived ZrO2 Thin Films Prepared by Ultraviolet Irradiation

Published online by Cambridge University Press:  03 March 2011

Kaori Nishizawa ,
Takeshi Miki ,
Kazuyuki Suzuki  and
Kazumi Kato
Kaori Nishizawa
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Moriyama-ku, Nagoya 463-8560, Japan
Takeshi Miki
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Moriyama-ku, Nagoya 463-8560, Japan
Kazuyuki Suzuki
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Moriyama-ku, Nagoya 463-8560, Japan
Kazumi Kato
Affiliation:
National Institute of Advanced Industrial Science and Technology (AIST), Moriyama-ku, Nagoya 463-8560, Japan
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Abstract

Wavelength dependence was observed in the ultraviolet (UV) irradiation-assisted crystallization of alkoxy-derived ZrO2 thin films. The surface grains of thin films deposited on Si(100) substrates became enlarged by UV irradiation using an ultrahigh-pressure mercury lamp. The crystallinity of thin films deposited on Si(100) substrates was improved by UV irradiation using a low-pressure mercury lamp. The reaction using the ultrahigh-pressure mercury lamp depended on the substrate type.

Keywords

PhotochemicalSolution depositionThin film
Type
Articles
Information
Journal of Materials Research , Volume 20 , Issue 11 , November 2005 , pp. 3133 - 3140
Copyright
Copyright © Materials Research Society 2005

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References

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