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Sub-part-per-trillion detection and analysis of submicrometer particles in integrated circuit processing chemicals

Published online by Cambridge University Press:  31 January 2011

D. Xu ,
R. F. Pinizzotto  and
J. A. Sees
D. Xu
Affiliation:
Department of Materials Science, University of North Texas, Denton, Texas 76203
R. F. Pinizzotto
Affiliation:
Department of Materials Science, University of North Texas, Denton, Texas 76203
J. A. Sees
Affiliation:
Texas Instruments Inc., P.O. Box 655012, MS 301, Dallas, Texas 75265
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Abstract

We have developed a new technique for the analysis of particulate contaminants in liquids (or gases) with an elemental detectability limit as low as 0.1 parts per trillion, and a particle concentration detectability limit as low as 1 particle/ml for particles greater than 0.2 μm in diameter. Samples are prepared using extraction replication and analyzed using analytical transmission electron microscopy. The methodology has been applied to the analysis of H2O2 and HF, important chemicals in integrated circuit fabrication. The new methodology should become an important tool in the identification of submicron-sized particles which adversely affect integrated circuit fabrication.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 3 , March 1998 , pp. 717 - 725
Copyright
Copyright © Materials Research Society 1998

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