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Protective AlZrN film for organic photoconductors

Published online by Cambridge University Press:  31 January 2011

Y. C. Chan
Affiliation:
Department of Electronic Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong
X. S. Miao
Affiliation:
Department of Electronic Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong
E. Y. B. Pun
Affiliation:
Department of Electronic Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong
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Abstract

AlZrN protective film with high transmissivity was deposited onto the organic photoconductor (OPC) surface, and the surface hardness was greatly increased by a factor of 1.5–3. The OPC surface protected by (Al100−xZrx)N (x ≤ 58.5%) film was significantly harder than that protected by AlN film. The electrophotographic properties of the OPC coated with (Al100−xZrx)N (x ≤ 37.7%) film were also better than those without coating or protected with AlN film, thus demonstrating the suitability of AlZrN film as a protective coating for enhancing the operating life of OPC.

Type
Articles
Copyright
Copyright © Materials Research Society 1998

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References

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