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Preparation and Microstructure Evolution of Both Freestanding and Supported TiO2 Thin Films

Published online by Cambridge University Press:  31 January 2011

Chen-Lung Fan ,
Daniel Ciardullo ,
Jay Paladino  and
Wayne Huebner
Chen-Lung Fan
Affiliation:
Ceramic Engineering Department, University of Missouri—Rolla, Rolla, Missouri 65401
Daniel Ciardullo
Affiliation:
Ceramic Engineering Department, University of Missouri—Rolla, Rolla, Missouri 65401
Jay Paladino
Affiliation:
Ceramic Engineering Department, University of Missouri—Rolla, Rolla, Missouri 65401
Wayne Huebner
Affiliation:
Ceramic Engineering Department, University of Missouri—Rolla, Rolla, Missouri 65401
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Abstract

Thin films of TiO2 were fabricated by spin-coating silicon wafers and cover glass with a titanium citrate complex precursor. The grain growth and phase development of both freestanding and supported films were studied using a combination of atomic force microscopy, x-ray diffraction, and transmission electron microscopy. Freestanding films prepared at 400 °C possess only the anatase phase, while supported films treated under the same conditions formed a small amount of the rutile phase. After heat treatment at various temperatures, results indicated that porosity was introduced into the films when the grain size grew close to the film thickness. Grain growth studies show that the grain size of the freestanding film underwent a drastic increase during the transformation from anatase to rutile. The grain size of the supported films did not show an abrupt change upon heat treatment. The grain size of the freestanding films treated at 900 °C was approximately three times larger than that of the supported films.

Type
Articles
Information
Journal of Materials Research , Volume 17 , Issue 6 , June 2002 , pp. 1520 - 1528
Copyright
Copyright © Materials Research Society 2002

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