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Photostructural modifications in poly(methylphenylsilylene) thin films: Excitation wavelength and atmosphere dependence

Published online by Cambridge University Press:  03 March 2011

B.G. Potter Jr. ,
H. Chandra ,
K. Simmons-Potter ,
G.M. Jamison  and
W.J. Thomes Jr.
B.G. Potter Jr.*
Affiliation:
Materials Science and Engineering Department, University of Arizona, Tucson, Arizona 85718
H. Chandra
Affiliation:
Materials Science and Engineering Department, University of Arizona, Tucson, Arizona 85718
K. Simmons-Potter
Affiliation:
Electrical and Computer Engineering Department, University of Arizona, Tucson, Arizona 85718
G.M. Jamison
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
W.J. Thomes Jr.
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
*
a) Address all correspondence to this author. e-mail: [email protected]
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Abstract

Electronic (UV-vis) and vibrational absorption spectroscopies were used to examine the impact of incident photon energy and local atmospheric composition on the development of photo-induced structural changes in poly[(methyl)(phenyl)silylene] thin films. The relative impact of atmosphere on the magnitude and nature of photostructural modifications in this material is found to be enhanced under 3.68 eV photon exposure where the incident photon is resonant with the lowest energy absorption of the Si-Si-conjugated backbone structure. This is in contrast to a greater overall magnitude of photo-induced structural change, with limited atmospheric dependence, observed under 5.1 eV exposure, resonant with absorption transitions associated with the π-conjugated phenyl ring side group. These results provide insight into the underlying structural mechanisms contributing to the large refractive index changes typically observed in these materials.

Keywords

Optical propertiesPolymerStructural
Type
Articles
Information
Journal of Materials Research , Volume 21 , Issue 9 , September 2006 , pp. 2393 - 2400
Copyright
Copyright © Materials Research Society 2006

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References

REFERENCES

1Harrah, L.A. and Zeigler, J.M.: Electronic spectra of polysilanes. Macromolecules 20, 601 (1987).CrossRefGoogle Scholar
2Miller, R.D. and Michl, J.: Polysilane high polymers. Chem. Rev. 89, 1359 (1989).CrossRefGoogle Scholar
3Trefonas, P. III, West, R., and Miller, R.D.: Polysilane high polymers. J. Am. Chem. Soc. 107, 2737 (1985).CrossRefGoogle Scholar
4Villegas, J.A., Olayo, R., and Cervantes, J.: GPC/LS analysis of the photodegradation products of poly(phenylmethysilane). J. Inorg. Organomet. Polym. 7, 51 (1997).CrossRefGoogle Scholar
5Hayashi, H., Kurando, T., Oka, K., Dohmaru, T., and Nakayama, Y.: Photobleaching process in polysilane films. Jpn. J. Appl. Phys. 35, 4096 (1996).CrossRefGoogle Scholar
6Potter, B.G. Jr., Jamison, G.M., Chandra, H., Simmons-Potter, K., and Thomes, W.J.: Atmospheric effects on the photosensitive response of poly(methylphenylsilane). Thin Films Mater. Lett. 59, 326 (2005).CrossRefGoogle Scholar
7Potter, B.G. Jr., Chandra, H., Simmons-Potter, K., Jamison, G.M., and Thomes, W.J.: Photoinduced refractive index change and absorption bleaching in poly(methylphenylsilane) under varied atmospheres. Eur. J. Glass Sci. Tech. Pt. B: Phys. Chem. Glass 47(2), 105 (2006).Google Scholar
8Thomes, W.J., Simmons-Potter, K., Phifer, C.C., Potter, B.G. Jr., Jamison, G.M., Jones, J.E., and Casadonte, D.J.: Photobleaching comparison of poly(phenylmethylsilane) and poly(phenylsilyne). J. Appl. Phys. 96, 6313 (2004).CrossRefGoogle Scholar
9Nagayama, N., Shimono, M., Sato, T., and Yokoyama, M.: Refractive index modification due to the UV-photodecomposition of polysilane and its application as phase mask. Mol. Cryst. Liq. Cryst. 349, 119 (2000).CrossRefGoogle Scholar
10Fujiki, M.: Structural defects in poly(methylphenylsilylene). Chem. Phys. Lett. 198, 177 (1992).CrossRefGoogle Scholar
11Rego, A.M. Botelho do, Pellegrino, O., and Vilar, M.R.: Vibrational and electronic excitations in poly(methylphenylsilane) and poly(diphenylsiloxane) films: Surface aspects. Macromolecules 34, 4987 (2001).CrossRefGoogle Scholar
12Skryshevskii, Y.A. and Vakhnin, A.Y.: Phototransformations in polysilane films. Polymer. Liq. Cryst. 43, 569 (2001).Google Scholar
13Pannell, K.H., Rozell, J.M., and Zeigler, J.M.: Ferrocenyl-containing polysilanes. Macromolecules 21, 276 (1988).CrossRefGoogle Scholar
14Miller, R.D. and Sooriyakumaran, R.: Alkoxy-substituted poly(diarylsilanes)-thermochromism and solvatochromism. Macromolecules 21, 3120 (1988).CrossRefGoogle Scholar
15Socrates, G.: Infrared and Raman Characteristic Group Frequencies, 3rd ed. (John Wiley & Sons, Chichester, NY, 2001).Google Scholar
16Nakayama, Y., Nonoyama, S., Dohmaru, T., and Han, L.: Photoluminescence study in photooxidation of poly(phenylmethylsilane). Films Solid State Commun. 92, 591 (1994).CrossRefGoogle Scholar
17Toman, P., Nespurek, S., Jang, J.W., and Lee, C.E.: Oligo[methyl(phenyl)silane] ion-radical conformations calculated by the B3LYP method. Int. J. Quantum Chem. 101, 746 (2005).CrossRefGoogle Scholar
18Harrah, L.A. and Zeigler, J.M.: Electronic spectra of polysilanes. Macromolecules 20, 601 (1987).CrossRefGoogle Scholar
19Phifer, C.C., Thomes, W.J. Jr., Simmons-Potter, K., and Potter, B.G. Jr.: Vacuum-ultraviolet spectroscopy of poly(methylphenylsilylene). J. Chem. Phys. 120, 1613 (2004).CrossRefGoogle ScholarPubMed