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Control of porosity in fluoride thin films prepared by vapor deposition

Published online by Cambridge University Press:  31 January 2011

Hakkwan Kim  and
Alexander H. King
Hakkwan Kim*
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907-2044
Alexander H. King
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907-2044
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

We have measured the porosity in thin films of lithium fluoride (LiF), magnesium fluoride (MgF2), barium fluoride (BaF2), and calcium fluoride (CaF2) as a function of the substrate temperature for films deposited by thermal evaporation onto glass substrates. The amount of porosity in the thin films was measured using an atomic force microscope and a quartz crystal thickness monitor. The porosity was very sensitive to the substrate temperature and decreased as the substrate temperature increased. Consistent behavior was observed among all of the materials in this study.

Keywords

FilmPhysical vapor deposition (PVD)Porosity
Type
Articles
Information
Journal of Materials Research , Volume 22 , Issue 7 , July 2007 , pp. 2012 - 2016
Copyright
Copyright © Materials Research Society 2007

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References

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