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Chemical interaction between nitrogen and iron in silica glasses via sequential ion-implantation

Published online by Cambridge University Press:  31 January 2011

Tetsuhiko Isobe ,
Tamotsu Toriyama ,
Robert A. Weeks  and
Raymond A. Zuhr
Tetsuhiko Isobe
Affiliation:
Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Yokohama 223, Japan
Tamotsu Toriyama
Affiliation:
Department of Energy Science and Engineering, Musashi Institute of Technology, Tamazutsumi 1-28-1, Setagaya-ku, Tokyo 158, Japan
Robert A. Weeks
Affiliation:
Department of Applied and Engineering Science, Vanderbilt University, Nashville, Tennessee 37235
Raymond A. Zuhr
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
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Abstract

Silica glass plates (Corning 7940 excimer grade) were implanted sequentially with N+ at 52 keV to different doses, ranging from 0 to 1.2 × 1017 ions cm−2, and then with Fe+ at 160 keV to 6 × 1016 ions cm−2 at room temperature and 4 µA cm−2. The intensity of ferromagnetic magnetic resonance (FMR) absorption and the magnetization calculated by the angular dependence of the FMR field reach maxima at an N/Fe atomic ratio ∼0.2. Two peaks due to Fe 2p3/2 electron are observed at 707.2 ± 0.2 and 710.9 ± 0.2 eV in the x-ray photoelectron spectra. The intensity of the former relative to the latter decreases with increasing the N dose. The conversion electron Mössbauer spectrum reveals the formation of superparamagnetic iron nitride as well as the existence of Fe2+ and Fe3+ in silica when implanting N+ to 7.5 × 1015 ions cm−2 and then Fe+ to 6 × 1016 ions cm−2 at N/Fe = 0.125. These results suggest that sequential ion-implantation of N+ and Fe+ produces iron nitride in silica glasses.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 8 , August 1998 , pp. 2144 - 2150
Copyright
Copyright © Materials Research Society 1998

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