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High power density SiGe millimeter-wave power amplifiers

Published online by Cambridge University Press:  01 July 2011

Thomas J. Farmer*
Affiliation:
The US Army Research Laboratory, 2800 Powder Mill Road, Adelphi, MD 20783, USA. Phone: +001 301 394 0487
Ali Darwish
Affiliation:
The American University in Cairo, AUC Avenue, New Cairo 11835, Egypt
Benjamin Huebschman
Affiliation:
The US Army Research Laboratory, 2800 Powder Mill Road, Adelphi, MD 20783, USA. Phone: +001 301 394 0487
Edward Viveiros
Affiliation:
The US Army Research Laboratory, 2800 Powder Mill Road, Adelphi, MD 20783, USA. Phone: +001 301 394 0487
Mona E. Zaghloul
Affiliation:
Department of Electrical and Computer Engineering, The George Washington University, 801 22nd Street NW, Washington, DC, 20052, USA
*
Corresponding author: T. J. Farmer Email: [email protected]

Abstract

This paper presents measured results for two-stage and three-stage high-voltage/high-power (HiVP) amplifiers implemented in a commercial 0.12 μm silicon germanium (SiGe) heterojunction bipolar transistor (HBT) bipolar Complementary Metal Oxide Semiconductor (BiCMOS) process at millimeter wave. The HiVP configuration provides a new tool for millimeter-wave silicon designers to achieve large output voltage swings, high output power density, customizable bias, and a way to minimize, if not eliminate, matching circuitry at millimeter-wave frequencies. The two-stage amplifier has achieved a PSAT = 5.41 dBm with a power added efficiency (PAE) of 8.06% at center frequency 30 GHz. The three-stage amplifier has achieved a PSAT = 8.85 dBm with a PAE of 11.35% with a total chip area of 0.068 mm2 at center frequency 30 GHz. Simulation, layout, fabrication, and measurement results are presented in this paper.

Type
Research Papers
Copyright
Copyright © Cambridge University Press and the European Microwave Association 2011. This is a work of the U.S. Government and is not subject to copyright protection in the United States

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References

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