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XUV and Soft X-Ray Radiation from Laser Produced Plasmas as Laboratory Spectroscopic Sources*

Published online by Cambridge University Press:  12 April 2016

P. Gohil ,
M.L. Ginter ,
T.J. McIlrath ,
H. Kapoor ,
D. Ma  and
M.C. Peckerar
P. Gohil
Affiliation:
University of Maryland, IPST College Park, MD 20742
M.L. Ginter
Affiliation:
University of Maryland, IPST College Park, MD 20742
T.J. McIlrath
Affiliation:
University of Maryland, IPST College Park, MD 20742
H. Kapoor
Affiliation:
Naval Research Laboratory Washington, DC 20375-5000
D. Ma
Affiliation:
Naval Research Laboratory Washington, DC 20375-5000
M.C. Peckerar
Affiliation:
Naval Research Laboratory Washington, DC 20375-5000

Extract

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Laser produced plasmas have been shown to be excellent sources for applications in the XUV and soft X-ray spectral region. We are using a 550 mj, 25 ns (FWHM) ND:YAG laser operating at a repetition rate of 10 Hz to produce plasmas above rotatable solid targets. The focal spot of the laser beam with a 31 cm lens was measured to be 170 μm (approximately twice the diffraction limit), using a diode array having a 170 μm resolution. Broadband output in the soft X-ray region was studied using a windowless PIN photodiode with an A1203 surface covered with a polyethylene filter with transmission between 44 Å and 120 Å. Results are presented for the source’s soft X-ray intensity for several elements as a function of laser energy, focus and driving wavelength, as are preliminary results using the source for high resolution spectroscopy and for soft X-ray lithography.

Type
Session 6. Poster Papers
Information
International Astronomical Union Colloquium , Volume 86: Eighth International Colloquium on Ultraviolet and X-ray Spectroscopy of Astrophysical and Laboratory Plasmas , 1984 , pp. 212
Copyright
Copyright © Naval Research Laboratory 1984. Publication courtesy of the Naval Research Laboratory, Washington, DC.

Footnotes

*

Work supported by Air Force grant AFOSR F49620-83-C-0130. P. Gohil acknowledges support from SERC (UK).

References

Carroll, P.K., Kennedy, E.T., and O’Sullivan, G., 1980, App. Opt., 19, 1454.CrossRefGoogle Scholar
Nagel, D.J., Brown, C.M., Peckerar, M.C., Ginter, M.L., Robinson, J., McIlrath, T.J., and Carroll, P.K., May 1984, App. Opt., 23, 1428.CrossRefGoogle Scholar