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X-Ray Investigations of Spinel Substrates

Published online by Cambridge University Press:  06 March 2019

J. E. A. Maurits  and
A. M. Hawley
J. E. A. Maurits
Affiliation:
Union Carbide, Crystal Products San Diego, California 92123
A. M. Hawley
Affiliation:
Union Carbide, Crystal Products San Diego, California 92123
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Abstract

Recent advances in MOS integrated circuit technology have opened new, high-volume applications utilizing epitaxial silicon-on- insulating substrates. To provide good quality heteroepitaxial silicon films for the semiconductor industry, a development program has been established to improve both the crystalline quality and the fabrication techniques for the most promising current substrate, magnesium aluminum spinel.

The role of X-ray diffraction techniques in the investigation of crystal quality, substrate surface quality, and epitaxial film quality are discussed, and results interpreted as the program is traced from crystal growth to epitaxial film analysis.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 15: Twentieth Annual Conference on Applications of X-ray Analysis, August 11-13, 1971 , 1971 , pp. 516 - 526
Copyright
Copyright © International Centre for Diffraction Data 1971

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References

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