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Stress-Depth Profiles in Magnetron Sputtered Mo Films Using Grazing Incidence X-Ray Diffraction (GIXD)

Published online by Cambridge University Press:  06 March 2019

B. L. Ballard
Affiliation:
University of Denver, Engineering Department Denver, Colorado 80208
P. K. Predecki
Affiliation:
University of Denver, Engineering Department Denver, Colorado 80208
D. N. Braski
Affiliation:
HTML, Oak Ridge National Laboratory, Oak Ridge Tennessee, 37831
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Abstract

Intrinsic stresses as a function of σ, the 1/e penetration depth were measured for a smooth, 1μm thick, fine grained, cylindrical post magnetron sputtered molybdenum film deposited on a vycor glass substrate in the dynamic deposition mode. Using grazing incidence diffraction and the Mo (321) reflection, lattice spacing profiles were determined for τ values from 200-4400 Å. The in-plane intrinsic stresses parallel and perpendicular to the post axis were determined employing the ϕ-integral method and assuming elastic isotropy. The results were related to the surface structure and composition profiles via atomic force microscopy (AFM) and auger electron spectroscopy (AES) respectively.

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1993

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