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Separation of Txrf Peaks and Background Using a Spreadsheet

Published online by Cambridge University Press:  06 March 2019

D. B. Brown ,
B. Cordis ,
J. V. Gilfrict  and
CM. Dozier
D. B. Brown
Affiliation:
Naval Research Laboratory, Washington, DC 20375
B. Cordis
Affiliation:
Ibis Technology, Danvers, MA 01923
J. V. Gilfrict
Affiliation:
SFA, Inc., Landover, MD 20785
CM. Dozier
Affiliation:
Naval Research Laboratory, Washington, DC 20375
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Abstract

In TXRF analysis of impurities in Si wafers, one of the analytical problems is the separation of the peaks of interest (e.g., fluorescence peaks from Fe or Cr) from various background artifacts. These background artifacts include (a) a large Si Kα fluorescence peak, (b) a large peak from the scattered and diffracted primary beam (e.g., W Lβ), (c) a continuum background, (d) scattered radiation in the vicinity of the primary beam peak, (e) an escape peak from the primary beam peak, and (f) spurious Fe and Ni peaks from the detector. This paper will present a scheme for the separation of these components using a fitting procedure based on a commercial spreadsheet.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 791 - 797
Copyright
Copyright © International Centre for Diffraction Data 1995

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References

1. WeisDrod, U., Gutschke, R., Kirath, J., and Schwenke, H., “Total Reflection X-Ray Fluorescence Spectrometry for Quantitative Surface and Layer Analysis”, Applied Physics A53, 449-456 (1991).Google Scholar
2. Knoth, J., Schwenke, H., and Weisbrod, U. , “Total reflection X-ray fluorescence spectrometry for surface analysis”, Spectrochernica Acta, Vol 44B, 477-481 (1989).Google Scholar
3. Yakushiji, Kenji, Ohkawa, Shinji, Yoshinaga, Atsushi, and Harada, Jimpei , “Main Peak Profiles of Total Reflection X-Ray Fluorescence Analysis of Si(001) Wafers Excited by Monochromatic X-Ray Beam W-Lβ (I)”, Jpn. J. Appl. Phys. 31, 2872–2876 (1992).Google Scholar
4. See, for example, the discussion of pulse pile-up and the action of the pile-up rejector in Quantitative X-Ray Spectrometry, by Ron Jenkins, Gould, R. W., and Dale Gedcke (Marcel Dekker, New York, 1981).Google Scholar
5. Yakushiji, Kenji, Ohkawa, Shinji, Yoshinaga, Atsushi, and Harada, Jimpei, “Main Peak Profiles of Total Reflection X-Ray Fluorescence Analysis of Si(001) Wafers Excited by Monochromatic X-Ray Beam W-Lβ (II)”, Jpn. J. Appl. Phys. 32, 1191–1196 (1993).Google Scholar
6. Private communication, J. Metz, Charles Evans, Inc.Google Scholar