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Residual Stress in Ion Implanted Titanium Nitride Studied by Parallel Beam Glancing Incidence X-ray Diffraction

Published online by Cambridge University Press:  06 March 2019

Daniel E. Geist ,
Anthony J. Perry ,
James R. Tireglio ,
Vaclav Valvoda  and
David Rafaja
Daniel E. Geist
Affiliation:
Martin Marietta, Mail Stop 9683, EO. Box 179 Denver CO 80201, U.S.A.
Anthony J. Perry
Affiliation:
Martin Marietta, Mail Stop 9683, EO. Box 179 Denver CO 80201, U.S.A.
James R. Tireglio
Affiliation:
Martin Marietta, Mail Stop 9683, EO. Box 179 Denver CO 80201, U.S.A.
Vaclav Valvoda
Affiliation:
Martin Marietta, Mail Stop 9683, EO. Box 179 Denver CO 80201, U.S.A.
David Rafaja
Affiliation:
Martin Marietta, Mail Stop 9683, EO. Box 179 Denver CO 80201, U.S.A.
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Abstract

Ion implantation is known to increase the lifetime of cutting tools. Current theories are the increase in lifetime is caused by an increase in the residual stress, or by work hardening of the surface associated with the implantation. In this work the effect of ion implantation on the residual stress in titanium nitride coatings made by the standard industrial methods of chemical and physical vapor deposition (CVD and PVD) is studied. It is found in the as-received condition (unimplanted), the residual stress levels are near zero for CVD materials and highly compressive, of the order of 6 GPa, for PVD materials. Ion implantation has no effect on the residual stress: in the coatings made by CVD. Nitrogen does increase the compressive residual stress by some 10% in the near surface regions of PVD coatings, while nickel-titanium dual metal ion implantation does not have any effect. It appears that the lifetime increase is not associated with residual stress effects.

Type
V. Residual Stress, Crystallite Size and rms Strain Determination by Diffraction Methods
Information
Advances in X-Ray Analysis , Volume 38: Forty-third Annual Conference on Applications of X-ray Analysis , 1994 , pp. 471 - 478
Copyright
Copyright © International Centre for Diffraction Data 1994

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