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Measurement of Thin Oxide Surface Film Thicknesses and Atomic Densities by the Analysis of Positive Ion Excited Soft X-Ray Spectral

Published online by Cambridge University Press:  06 March 2019

W. P. Saylor  and
C. L. Marks
W. P. Saylor
Affiliation:
American Machine & Foundry Company, Alexandria, Virginia
C. L. Marks
Affiliation:
American Machine & Foundry Company, Alexandria, Virginia
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Abstract

Characteristic soft x-ray emission lines created as a result of low energy (10-100keV) positive ion excitation of a target material has been applied to the study of thin films of oxygen that form naturally on metal surfaces. The specific metals investigated were aluminum and nickel aa well as a number of their corresponding alloys.

Low energy positive ions are well suited as projectiles for the study of thin films in that they have low penetrating powers, yet produce high x-ray yields for K-, L-, and M-shell elemental x-ray lines. Perhaps the most important feature is the fact that no background bremsstrahlung continuum x-radiation is generated in the slowing processes of the ions. Exploiting the advantages of these facts, a special high sensitivity detection technique has been developed for the soft x-ray analysis of the constituents that make up a particular thin surface film.

The physical basis for thickness and atomic density measurements of thin surface films by positive ion excitation are discussed. Calibration data are presented for thin films of known thickness and composition establishing the sensitivity of the method for the measurement of the elemental atomic densities of thin films down to a few monolayers or approximately 10 Å in thickness. Finally, the results of the analysis of oxide surface films of aluminum, nickel and some of their alloys are presented and discussed.

The objective of this continuing program is to gain an understanding of the mechanisms and principles governing the formation of oxide surface films on metals with the basic goal of producing new alloying techniques for metal passification in a saline environment.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 12: Seventeenth Annual Conference on Applications of X-ray Analysis, August 21-23, 1968 , 1968 , pp. 457 - 479
Copyright
Copyright © International Centre for Diffraction Data 1968

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References

1.Work performed under the auspices of the U. S. Department of Interior - Office of Saline Water.Google Scholar
2.Presently with Wolf Research and Development Corp., Bladensburg, Maryland.Google Scholar
3. Sterk, A. A., X-Ray Generation by Proton Bombardment, W. M. Mueller, Editor, Advances in X-Ray Analysis, Vol. 8, Plenum Press, New York 1965, 189–197.Google Scholar
4. Sterk, A. A., Harks, C. L., Saylor, W. P., Production Efficiencies of X-Ray Emission Spectra by Proton Bombardment, J. B. Newkirk Editor, Advances in X-Ray Analysis, Vol. 10, Plenum Press, New York, 1966, 399–408.Google Scholar
5. Sterk, A. A., Saylor, W. P., Marks, C. L., X-Ray Analysis of Thin Films by Proton Bombardment, Norelco Reporter, 14: 99–102, 1967.Google Scholar
6. Hauser, U., Kerler, W., Easily Mounted Aluminum Oxide Foils for Windows and Backings, Rev. of Soi. Inst., 29 : 380–385, 1958.Google Scholar
7. Von Ardenne, M., Tabellen Zur Angewandten Physik, Veb Deutscher Verlag Der Wissenschaften, Berlin, 1962, 687-688.Google Scholar
8. Allison, S. K., Warshaw, S. D., Passage of Heavy Particles Through Matter, Rev. of Mod. Phys., 25: 779–806, 1953.Google Scholar
9. White, W., Mueller, R. M., Measurement of Atomic - Stopping Gross Sections at Low Energies, Jour. of Appl. Phys., 38: 3660–3662, 1967.Google Scholar
10. Kaminsky, M., Atomic and Ionic Impact Phenomena on Metal Surfaces, Academic Press, New York, Chapter 10, 1965.Google Scholar
11. Andersen, T., Sorensen, G., Range Studies Using a Hew Chemical Film Technique, Can. Jour. of Phys., 46: 483–488, 1968.Google Scholar
12. Kelly, R., Sputtering and Depth-Distribution Phenomena in KCl, Al2O3, and TiO2, Can. Jour. of Phys., 46: 473–482, 1968.Google Scholar