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Characterization of Permalloy Thin Films via Variable Sample Exit Angle Ultrasoft X-ray Fluorescence Spectrometry

Published online by Cambridge University Press:  06 March 2019

George Andermann ,
Francis Fujiwara ,
T.C. Huang ,
J.K. Howard  and
N. Staud
George Andermann
Affiliation:
Department of Chemistry, University of Hawaii Honolulu, Hawaii 96822
Francis Fujiwara
Affiliation:
Department of Chemistry, University of Hawaii Honolulu, Hawaii 96822
T.C. Huang
Affiliation:
IBM-Almadden Research Center San Jose, CA 95120
J.K. Howard
Affiliation:
IEM-General Products Division San Jose, CA 95193
N. Staud
Affiliation:
IEM-General Products Division San Jose, CA 95193
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Extract

Recently variable sample exit-angle x-ray fluorescence spectrometry (VEA-XRF) has been shorn to be a useful analytical tool for monitoring the oxidation of the surfaces of bulk Cu, Ni as well as that of Fe. In these studies advantage was taken of the well known phenomenon that for each transition metal oxide (MO) Lβ/Lα intensity ratio value is higher than for the transition metal (M), itself. Within the limits of the photon-escape depth de, which for these photons are generally below 5000 Å, varying the sample exit-angle θ offers an opportunity for seeing whether or not the oxidation of the surfaces of bulk M belongs to one of the following two classes: (I) uniform oxidation throughout the entire observable sample-depth, (II) preferential oxidation of the top surface layer, i.e. depth dependent oxidation.

Type
V. XRF Applications
Information
Advances in X-Ray Analysis , Volume 32: Thirty-Seventh Annual Conference on Applications of X-ray Analysis, August 1-5, 1988 , 1988 , pp. 261 - 268
Copyright
Copyright © International Centre for Diffraction Data 1988

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References

1. Andermann, G., Appl, Surf. Sci, 31, 1–41 (1988).Google Scholar
2. Scimeca, T., Ph. D. Dissertation, Univ. of Hawaii (1988).Google Scholar
3. Fischer, D.W., J. Appl. Phys. 36, 2048 (1965).Google Scholar
4. Andermann, G., Berghnut, L., Karras, M., Grieschaber, G. and Smith, J., Rev. Sci. Instr. 51, 814 (1980); Andermann, G., Burhard, F., Kim, R., Fujiwara, F., and Karras, M., Spec, Letters, 16, 851 (1983).Google Scholar
5. Bertin, I.P., Principles of X-Ray Spectrometric Analysis, 2nd Ed. (Pleneum Press) New York (1975).Google Scholar
6. Kaihola, L. and Bremer, J., J. Phys. C: Solid State Phys. , 14, L 43 (1981).Google Scholar