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X-Ray Studies of Chromium Nitride (CrxNy) Thin Films Deposited by Reactive Magnetron Sputtering

Published online by Cambridge University Press:  06 March 2019

M. Charbonnier ,
M. Romand ,
A. Roche  and
J.P. Terrat
M. Charbonnier
Affiliation:
Department of Chemistry and Chemical Engineering (CNRS, URA417), Université Claude Bernard - Lyon I 69622 Villeurbanne Cedex, FRANCE
M. Romand
Affiliation:
Department of Chemistry and Chemical Engineering (CNRS, URA417), Université Claude Bernard - Lyon I 69622 Villeurbanne Cedex, FRANCE
A. Roche
Affiliation:
Department of Chemistry and Chemical Engineering (CNRS, URA417), Université Claude Bernard - Lyon I 69622 Villeurbanne Cedex, FRANCE
J.P. Terrat
Affiliation:
Centre Stéphanois de Recherches Mecaniques, Hydromécanique et Frottement, 42160 Andrézieux Bouthéon Cedex, FRANCE
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Abstract

Chromium nitride hard coatings have been prepared by a plasma process by varying nitrogen partial pressure. The crystallographic structure of these samples has been investigated by XRD and their chemical composition and stoichiometry by Low Energy Electron Induced x-ray Spectrometry (LEEIXS).

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 819 - 827
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

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