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Recent Developments in Surface and Thin Film Analysis using Low - Energy Electron Induced X-Ray Spectrometry (LEEIXS)

Published online by Cambridge University Press:  06 March 2019

M.J. Romand ,
F. Gaillard  and
M. Charbonnier
M.J. Romand
Affiliation:
Department of Applied Chemistry and Chemical Engineering (CNRS, URA 417), Université Claude Bernard - Lyon I 69622 Villeurbanne Cedex, FRANCE
F. Gaillard
Affiliation:
Department of Applied Chemistry and Chemical Engineering (CNRS, URA 417), Université Claude Bernard - Lyon I 69622 Villeurbanne Cedex, FRANCE
M. Charbonnier
Affiliation:
Department of Applied Chemistry and Chemical Engineering (CNRS, URA 417), Université Claude Bernard - Lyon I 69622 Villeurbanne Cedex, FRANCE
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Abstract

A review is given of the main gas-discharge sources and auxiliary equipments which were used in soft and ultra-soft X-ray emission spectrometry. Special attention is paid to the basic principles and instrumentation of low-energy electron-induced X-ray spectrometry (LEEIXS) whose excitation source is an electron beam generated in a glow-discharge system. Capabilities of LEEIXS in surface and thin film analysis and characterization are illustrated by examples dealing with control and optimization of surface treatment and thin film deposition processes. Sensitivity of the technique down to the submonolayer range and influence of backscattering phenomena are shown.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 767 - 781
Copyright
Copyright © International Centre for Diffraction Data 1991

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