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Focused Ion Beam Interfaced with a 200 keV Transmission Electron Microscope for In Situ Micropatterning on Semiconductors
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- Journal:
- Microscopy and Microanalysis / Volume 4 / Issue 3 / June 1998
- Published online by Cambridge University Press:
- 28 July 2005, pp. 207-217
- Print publication:
- June 1998
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- Article
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