7 results
Post Deposition Ultraviolet Treatment of Silicon Nitride Dielectric: Modeling and Experiment
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- Journal:
- MRS Online Proceedings Library Archive / Volume 910 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0910-A19-04
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- 2006
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Reliability of Dielectric Barrier Films in Copper Damascene Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 812 / 2004
- Published online by Cambridge University Press:
- 17 March 2011, F5.10
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- 2004
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Resist Poisoning-Free Advanced PECVD-Based Anti-Reflective Coating (ARC) for 90nm Technology and Beyond
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- Journal:
- MRS Online Proceedings Library Archive / Volume 782 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A5.91
- Print publication:
- 2003
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PECVD Silicon Nitride for Damascene Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 715 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, A10.7
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- 2002
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Advanced PECVD-Based Anti-Reflective Coating for 90nm Generation Interconnects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N6.2
- Print publication:
- 2002
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High Density Plasma Silicon Carbide as a Barrier/Etch Stop Film for Copper Damascene Interconnects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D9.14.1
- Print publication:
- 2000
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HDP-FSG Integration in Multilevel Interconnect Devices
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- Journal:
- MRS Online Proceedings Library Archive / Volume 564 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 443
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- 1999
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