Hostname: page-component-586b7cd67f-rcrh6 Total loading time: 0 Render date: 2024-11-24T05:34:19.505Z Has data issue: false hasContentIssue false
  • English
  • Français

Certification of NIST Standard Reference Material 640d

Published online by Cambridge University Press:  29 February 2012

David R. Black ,
Donald Windover ,
Albert Henins ,
David Gil ,
James Filliben  and
James P. Cline
David R. Black*
Affiliation:
National Institute of Standards and Technology, Gaithersburg, Maryland 20899
Donald Windover
Affiliation:
National Institute of Standards and Technology, Gaithersburg, Maryland 20899
Albert Henins
Affiliation:
National Institute of Standards and Technology, Gaithersburg, Maryland 20899
David Gil
Affiliation:
National Institute of Standards and Technology, Gaithersburg, Maryland 20899
James Filliben
Affiliation:
National Institute of Standards and Technology, Gaithersburg, Maryland 20899
James P. Cline
Affiliation:
National Institute of Standards and Technology, Gaithersburg, Maryland 20899
*
a)Author to whom correspondence should be addressed. Electronic mail: [email protected]
Get access Rights & Permissions [Opens in a new window]

Abstract

The National Institute of Standards and Technology (NIST) certifies a variety of standard reference materials (SRM) to address specific aspects of instrument performance for divergent beam diffractometers. This paper describes SRM 640d, the fifth generation of this powder diffraction SRM, which is certified with respect to the lattice parameter. It consists of approximately 7.5 g silicon powder specially prepared to produce strain-free particles in a size range between 1 and 10 μm to eliminate size-broadening effects. It is typically used for calibrating powder diffractometers for the line position and line shape. A NIST built diffractometer, incorporating many advanced design features, was used to certify the lattice parameter of the silicon powder measured at 22.5 °C. Both type A, statistical, and type B, systematic, errors have been assigned to yield a certified value for the lattice parameter of a=0.543 159±0.000 020 nm.

Keywords

standard reference materialX-ray diffractioncertificationlattice parametersilicon
Type
Technical Articles
Information
Powder Diffraction , Volume 25 , Issue 2 , June 2010 , pp. 187 - 190
Copyright
Copyright © Cambridge University Press 2010

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Bergamin, A., Cavagnero, G., Mana, G., and Zosi, G. (1997). “Lattice parameter and thermal expansion of monocrystalline silicon,” J. Appl. Phys. JAPIAU 82, 5396–5400.10.1063/1.366308CrossRefGoogle Scholar
Bergmann, Böttger J., Kleeberg, R., Haase, A., and Breidenstein, B. (2000). “Advanced fundamental parameters model for improved profile analysis,” Proceedings of the Fifth European Conference on Residual Stresses, Delft-Noordwijkerhout, The Netherlands, edited by A. J., , Delhez, R., and Mittemeijer, E. J., pp. 303–308.Google Scholar
Bruker AXS GmbH (2008). TOPAS General Profile and Structure Analysis Software for Powder Diffraction Data, V4.0 (computer program), Karlsruhe, Germany.Google Scholar
Cheary, R. W. and Coelho, A. A. (1992). “A fundamental parameters approach to X-ray line-profile fitting,” J. Appl. Crystallogr. JACGAR 25, 109–121.10.1107/S0021889891010804CrossRefGoogle Scholar
Cheary, R. W. and Coelho, A. A. (1998a). “Axial divergence in a conventional X-ray powder diffractometer. I. Theoretical foundations,” J. Appl. Crystallogr. JACGAR 31, 851–861.10.1107/S0021889898006876CrossRefGoogle Scholar
Cheary, R. W. and Coelho, A. A. (1998b). “Axial divergence in a conventional X-ray powder diffractometer. II. Implementation and comparison with experiment,” J. Appl. Crystallogr. JACGAR 31, 862–868.10.1107/S0021889898006888CrossRefGoogle Scholar
Cline, Chung J. P. (2000). Industrial Applications of X-ray Diffraction, edited by F. H., and Smith, D. K. (Marcel Dekker, New York), pp. 903–917.Google Scholar
Hölzer, G., Fritsch, M., Deutsch, M., Härtwig, J., and Förster, E. (1997). “K α 1,2 and K β 1,3 X-ray emission lines of the 3d transition metals,” Phys. Rev. A PLRAAN 56, 4554–4568.10.1103/PhysRevA.56.4554CrossRefGoogle Scholar
ISO (1993). Guide to the Expression of Uncertainty in Measurement, 1st ed. (International Organization for Standardization, Geneva, Switzerland).Google Scholar
Kessler, E. G., Henins, A., Deslattes, R. D., Nielsen, L., and Arif, M. (1994). “Precision comparison of the lattice parameters of silicon monocrystals,” J. Res. Natl. Inst. Stand. Technol. JRITEF 99, 1–18.CrossRefGoogle ScholarPubMed
Maskil, M. and Deutsch, M. (1988). “X-ray K α satellites of copper,” Phys. Rev. A PLRAAN 38, 3467–3472.10.1103/PhysRevA.38.3467CrossRefGoogle Scholar
NIST (2000). “Lanthanum hexaboride powder line position and line shape standard for powder diffraction,” Standard SRM 660a, National Institute of Standards and Technology, U.S. Department of Commerce, Gaithersburg, MD.Google Scholar
NIST (2008). “Alumina internal standard for quantitative analysis by X-ray powder diffraction,” Standard SRM 676a, National Institute of Standards and Technology, U.S. Department of Commerce, Gaithersburg, MD.Google Scholar
NIST (2009). “Silicon powder line position and line shape standard for powder diffraction,” Standard SRM 640d, National Institute of Standards and Technology, U.S. Department of Commerce, Gaithersburg, MD.Google Scholar
Rietveld, H. M. (1967). “Line profiles of neutron powder-diffraction peaks for structure refinement,” Acta Crystallogr., Sect. A: Cryst. Phys., Diffr., Theor. Gen. Crystallogr. ACACBN 22, 151–152.10.1107/S0365110X67000234Google Scholar
Rietveld, H. M. (1969). “A profile refinement method for nuclear and magnetic structures,” J. Appl. Crystallogr. JACGAR 2, 65–71.10.1107/S0021889869006558CrossRefGoogle Scholar
Taylor, B. N. and Kuyatt, C. E. (1994). Guidelines for Evaluating and Expressing the Uncertainty of NIST Measurement Results (NIST Technical Note 1297), U.S. Government Printing Office, Washington, D.C. 〈http://physics.nist.gov/Pubs/〉.CrossRefGoogle Scholar
van Berkum, J. G. M., Sprong, G. J. M., de Keijser, Th. H., Delhez, R., and Sonneveld, E. J. (1995). “The optimum standard specimen for X-ray diffraction line-profile analysis,” Powder Diffr. PODIE2 10, 129–139.CrossRefGoogle Scholar