Research Article
Optical Fiber Pyrometry with in-Situ Detection of Wafer Radiance and Emittance—Accufiber's Ripple Method
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- 21 February 2011, 139
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Rapid Thermal Processing: Status, Problems and Options After the First 25 Years
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- 21 February 2011, 149
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Evaluation of a vertical tube concept for RTP
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- 21 February 2011, 165
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Investigation of Dynamical Temperature Behaviour in Rtp
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- 21 February 2011, 171
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To the Influence of the Wafer Edge in RTP
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- 21 February 2011, 177
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An Extensible Software Design Applied to Rapid Thermal Processing
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- 21 February 2011, 183
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Stress and Warpage Studies of Silicon Based Plain and Patterned Films During Rapid Thermal Processing (RTP)
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- 21 February 2011, 189
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Simulation of Rapid Thermal Processing Equipment and Processes
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- 21 February 2011, 197
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Three Dimensional Temperature Uniformity Modeling of a Rapid Thermal Processing Chamber
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- 21 February 2011, 211
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Microscale Radiation Effects in Multilayer Thin-Film Structures During Rapid Thermal Processing
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- 21 February 2011, 217
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Rapid Thermal Processor Modeling, Control, and Design for Temperature Uniformity
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- 21 February 2011, 223
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Combined Simulation and Measurement Study of Temperature Uniformity in Rapid Thermal Processing
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- 21 February 2011, 231
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Rta Implant Monitor: Does it Tell the Truth?
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- 21 February 2011, 237
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Stability of Ultra-Thin Gate Oxides with Boron Doped Polysilicon Gate Structures After Rapid Thermal Annealing
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- 21 February 2011, 247
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Boron Diffusion in Fluorine Preamorphized Silicon During Rapid Thermal Annealing
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- 21 February 2011, 253
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Modeling of Boron Diffusion and Activation for Nonequilibrium Rapid Thermal Annealing Application
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- 21 February 2011, 259
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Enhanced Boron Diffusion in Silicon with BF2-Implanted CoSi2 AS Diffusion Source and Under Rapid Thermal Annealing
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- 21 February 2011, 265
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Using CoSi2 /Polysilicon Polycide Structure as a Gate Diffusion Source in Rapid Thermal Processing
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- 21 February 2011, 271
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Semi-Empirical Model for Boron Diffusion During Rapid Thermal Annealing of BF2 Implanted Silicon
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- 21 February 2011, 277
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Reduced Thermal Budget Borophosphosilicate Glass (BPSG) Fusion and Implant Activation Using Rapid Thermal Annealing and Steam Reflow
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- 21 February 2011, 283
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