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Tilted illumination exit-wave restoration is compared for two aberration-corrected instruments at different accelerating voltages. The experimental progress of this technique is also reviewed and the significance of off-axial aberrations examined. Finally, the importance of higher order aberration compensation combined with careful correction of the lower order aberrations is highlighted.

We made aperture masking optical interferometry experiments using up to 30 apertures and with a tip-tilt correction of wavefront error. We examined the performance of minimum redundant configurations of 11–30 sub-apertures on the pupil plane mask. These configurations have two advantages; the redundancy noise is as small as realized in non-redundant masking method, and the uv-coverage is as high as in speckle interferometry enabling to get reconstructed images without mask exchange. We also examined the effect of tip-tilt wavefront correction within a telescope pupil in front of the aperture masking optics. The light coherency between sub-apertures was shown to increase by the correction.

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Exceeding Conventional Resolution Limits in High-Resolution Transmission Electron Microscopy Using Tilted Illumination and Exit-Wave Restoration

Minimum Redundant Aperture Masking Interferometry With Tip-Tilt Wavefront Correction

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Exceeding Conventional Resolution Limits in High-Resolution Transmission Electron Microscopy Using Tilted Illumination and Exit-Wave Restoration

Minimum Redundant Aperture Masking Interferometry With Tip-Tilt Wavefront Correction