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Fabrication and characterization of metal-ferroelectric-insulator-Si diodes and transistors with different HfSiON buffer layer thickness
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- Journal:
- Journal of Materials Research / Volume 23 / Issue 10 / October 2008
- Published online by Cambridge University Press:
- 31 January 2011, pp. 2727-2732
- Print publication:
- October 2008
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- Article
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