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The Role of SiH3 Diffusion in Determining the Surface Smoothness of Plasma-Deposited Amorphous Si Thin Films: An Atomic-Scale Analysis
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- Journal:
- MRS Online Proceedings Library Archive / Volume 862 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, A3.2
- Print publication:
- 2005
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- Article
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