2 results
Irreversible Tensile Stress Development in PECVD Silicon Nitride Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 795 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, U1.6
- Print publication:
- 2003
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- Article
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Stress Stability of PECVD Silicon Nitride Films During Device Fabrication
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- Journal:
- MRS Online Proceedings Library Archive / Volume 766 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E6.3
- Print publication:
- 2003
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- Article
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